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Home»TRIZ Case»Modular RF Tuning for Balanced Plasma Systems

Modular RF Tuning for Balanced Plasma Systems

May 22, 20263 Mins Read
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Modular RF Tuning for Balanced Plasma Systems

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Summary

Problems

Current semiconductor processing systems face challenges in achieving balanced RF power distribution across multiple stations due to limited real estate, lack of station-by-station power control, and interference between low to mid frequency and high frequency RF power adjustments, leading to potential arcing and inefficient tuning.

Innovation solutions

A modular recipe-controlled calibration (MRCC) system with parallel LF/MF and HF tuning circuits, allowing independent adjustment of RF power at each station, using variable capacitors and inductors to maintain cross parallel isolation and active tuning, along with absolute encoders for capacitor position tracking and a clamshell design for easier assembly.

TRIZ Analysis

Specific contradictions:

control box structure
vs
station-by-station power control

General conflict description:

Device complexity
vs
Adaptability or versatility
TRIZ inspiration library
1 Segmentation
Try to solve problems with it

Principle concept:

If a single control box is used to split and distribute RF power to multiple stations, then the device complexity is reduced, but the ability to control RF power delivery to each station individually is lost

Why choose this principle:

The patent divides the single control box into multiple independent modular units, with each module controlling RF power to a specific station. This segmentation enables individual power control for each station while maintaining a manageable system architecture through standardized modular designs.

TRIZ inspiration library
17 Another dimension (Dimensionality change)
Try to solve problems with it

Principle concept:

If the real estate inside the RF power splitting module is maximized to fit all components, then the device complexity is reduced, but the risk of arcing increases due to insufficient clearance and creepage

Why choose this principle:

The patent transitions from a two-dimensional planar layout to a three-dimensional configuration by stacking circuit boards vertically and using multiple layers. This dimensional change provides sufficient clearance and creepage distances for high voltage isolation while maintaining a compact overall module size and integration.

Application Domain

rf tuning plasma systems modular design

Data Source

Patent US20210202208A1 Modular recipe controlled calibration (MRCC) apparatus used to balance plasma in multiple station system
Publication Date: 01 Jul 2021 TRIZ 电器元件
FIG 01
US20210202208A1-D00001
FIG 02
US20210202208A1-D00002
FIG 03
US20210202208A1-D00003
Login to view Image

AI summary:

A modular recipe-controlled calibration (MRCC) system with parallel LF/MF and HF tuning circuits, allowing independent adjustment of RF power at each station, using variable capacitors and inductors to maintain cross parallel isolation and active tuning, along with absolute encoders for capacitor position tracking and a clamshell design for easier assembly.

Abstract

A circuit tuning radio frequency (RF) power. The circuit includes a low to mid frequency (LF/HF) tuning circuit including a variable LF/MF capacitor coupled in series with an LF/MF inductor. The LF/MF tuning circuit is coupled between ground and a common node configured to receive an RF input. The circuit includes a high frequency (HF) tuning circuit coupled in parallel to the LF/MF tuning circuit between ground and the common node. The HF tuning circuit includes a variable HF capacitor coupled in series with an HF inductor. Cross parallel isolation occurs between the LF/MF inductor of the LF/MF tuning circuit and the HF inductor of the HF tuning circuit when adjusting the variable LF/MF capacitor or variable HF capacitor.

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    modular design plasma systems rf tuning
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    Table of Contents
    • Modular RF Tuning for Balanced Plasma Systems
      • Summary
      • TRIZ Analysis
      • Data Source
      • Accelerate from idea to impact
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