Plasma Parameter Measurement with Microwave Cutoff Probe
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Summary
Problems
The increasing miniaturization and high integration of semiconductor elements have heightened the sensitivity of plasma processes, necessitating precise measurement methods for plasma parameters to ensure product quality.
Innovation solutions
A method and apparatus for measuring plasma parameters using a cutoff probe with line-shaped antennas and processors to calculate microwave band spectra and moving minima, enabling precise plasma density measurement.
TRIZ Analysis
Specific contradictions:
General conflict description:
Principle concept:
If conventional measurement methods are used in high-density plasma environments, then measurement capability is maintained, but measurement precision deteriorates due to plasma density effects
Why choose this principle:
The patent introduces a cutoff probe as an intermediary measurement device that uses microwave transmission through plasma to indirectly measure plasma parameters. The probe includes a transmit antenna that sends microwaves and a receive antenna that detects transmitted signals, allowing measurement without direct contact with high-density plasma regions where conventional probes fail.
Principle concept:
If conventional measurement methods are used in high-density plasma environments, then measurement capability is maintained, but measurement precision deteriorates due to plasma density effects
Why choose this principle:
The patent replaces conventional direct-contact mechanical probe measurement methods with electromagnetic wave-based measurement. Instead of using physical sensors that must be inserted into plasma, the system uses microwave radiation to probe plasma characteristics, eliminating the mechanical intrusion problems that cause measurement failures in high-density environments.
Application Domain
Data Source
AI summary:
A method and apparatus for measuring plasma parameters using a cutoff probe with line-shaped antennas and processors to calculate microwave band spectra and moving minima, enabling precise plasma density measurement.
Abstract
An apparatus for measuring parameters of plasma includes a cutoff probe. The cutoff probe includes: a first antenna having a line shape and configured to emit a microwave to the plasma in response to the signal provided by at least one processor; a second antenna having a line shape and configured to generate an electrical signal in response to receiving the microwave emitted by the first antenna and transferred through the plasma; a first insulating layer; a second insulating layer; a first shield; a second shield; an end protection layer covering an end of each of the first insulating layer, the second insulating layer, the first shield, and the second shield; a first antenna protection layer, of insulating nature, covering the first antenna; and a second antenna protection layer, of insulating nature, covering the second antenna.