Precise Contamination Analysis for Semiconductor Wafers
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Summary
Problems
Existing methods for analyzing and evaluating contamination on semiconductor wafers, particularly the front plane flat and chamfered parts, suffer from instability and inaccuracies due to the mixing of impurities from non-target regions, requiring separate devices and processes that are time-consuming and inefficient.
Innovation solutions
A method and device that use a liquid drop holder to scan and collect chemicals in a circumference direction, adjusting its position and height to ensure precise contact with both the front plane flat and chamfered parts, preventing contamination from adjacent regions and allowing for a single device to analyze both areas efficiently.
TRIZ Analysis
Specific contradictions:
General conflict description:
Principle concept:
If separate devices are used for analyzing front plane flat part and chamfered part, then measurement precision is improved, but device complexity and operational time increase
Why choose this principle:
The patent combines the analysis of front plane flat part and chamfered part into a single device by integrating a rotating mechanism that can position the wafer at different angles. The liquid drop holder and chemicals collecting device remain unified while the wafer rotation capability allows sequential analysis of different regions, eliminating the need for separate devices and reducing operational complexity.
Principle concept:
If separate devices are used for analyzing front plane flat part and chamfered part, then measurement precision is improved, but device complexity and operational time increase
Why choose this principle:
The single device is designed with multi-functionality to analyze both front plane flat part and chamfered part. The wafer rotating mechanism enables the same chemical collection system to serve multiple analysis purposes by adjusting wafer orientation, making one device universal for different contamination analysis needs.
Application Domain
Data Source
AI summary:
A method and device that use a liquid drop holder to scan and collect chemicals in a circumference direction, adjusting its position and height to ensure precise contact with both the front plane flat and chamfered parts, preventing contamination from adjacent regions and allowing for a single device to analyze both areas efficiently.
Abstract
An apparatus and a method are provided for accurately analyzing and evaluating a degree of contamination on a chamfered part without mixing impurities from parts other than the chamfered part into chemicals. At a position in which, on a front plane flat part of a semiconductor wafer, a boundary region bordering the chamfered part can come into contact with the chemicals, a radius direction position of the chemicals (a distance between a chemicals center and a wafer center) is determined, scanning is performed in a circumference direction, and the chemicals including impurities are collected. Then, at a position that can be brought into contact with the both chamfered part of the semiconductor wafer and the boundary region, a radius direction position of the chemicals is determined, scanning is performed in the circumference direction and the chemicals including impurities are collected. A liquid drop holder is, for instance, relatively rotated in the circumference direction from a desired start point on the circumference of the semiconductor wafer to a finish point.