Substrate Processing Apparatus for Uniform High-Speed Manufacturing
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Summary
Problems
Conventional substrate processing apparatuses face challenges in increasing processing rate without causing the processing liquid to spout or the substrate holder to float, and in achieving uniform processing due to limitations in flow velocity and flow type.
Innovation solutions
The substrate processing apparatus incorporates a guide cover, processing-liquid nozzles, baffle plates, paddle mechanisms, inert-gas supply nozzles, and elastic membranes to create a descending turbulent flow, preventing spouting and ensuring uniform substrate processing by increasing flow velocity and agitation.
TRIZ Analysis
Specific contradictions:
General conflict description:
Principle concept:
If the flow velocity of the processing liquid in the inner chamber is increased to increase processing rate, then the processing rate is improved, but the processing liquid may spout from the inner chamber or the substrate holder may be floated up
Why choose this principle:
The patent inverts the conventional ascending flow direction to a descending flow direction. The processing liquid is supplied from the upper portion of the inner chamber downward to the substrate, rather than ascending from the bottom. This inversion allows high flow velocity to be achieved without causing the substrate holder to float or the processing liquid to spout, as the gravity-assisted downward flow naturally stabilizes the substrate holder position.
Principle concept:
If the flow velocity of the processing liquid in the inner chamber is increased to increase processing rate, then the processing rate is improved, but the processing liquid may spout from the inner chamber or the substrate holder may be floated up
Why choose this principle:
The patent introduces a guide cover with a through-hole that constrains the processing liquid flow path. The guide cover directs the processing liquid to flow downward along the substrate surface in a controlled manner, transforming the uncontrolled spouting issue into a controlled descending flow that maintains both high velocity and stability.
Application Domain
Data Source
AI summary:
The substrate processing apparatus incorporates a guide cover, processing-liquid nozzles, baffle plates, paddle mechanisms, inert-gas supply nozzles, and elastic membranes to create a descending turbulent flow, preventing spouting and ensuring uniform substrate processing by increasing flow velocity and agitation.
Abstract
The substrate processing apparatus includes a processing chamber including an outer chamber configured to hold a processing liquid and an inner chamber capable of surrounding the substrate held by the substrate holder; a liquid delivery pipe having one end coupled to a bottom of the inner chamber and other end coupled to the outer chamber; a pump configured to suck the processing liquid from the inner chamber through the liquid delivery pipe and to deliver the processing liquid to the outer chamber through the liquid delivery pipe; and a guide cover having a through-hole in which the substrate holder can be inserted. The guide cover is located below an upper end of the outer chamber and above the inner chamber.