APR 30, 202667 MINS READ
Peel strength in copper clad laminates arises from a combination of mechanical interlocking, chemical bonding, and interfacial energy matching between the copper foil and the polymer substrate. The 180° peel strength, measured perpendicular to the laminate plane, serves as the primary metric for adhesion quality and is influenced by copper surface roughness, oxide layer composition, and resin wetting behavior 118.
Controlled surface roughness on copper foil is essential for mechanical interlocking with the resin matrix. Patent 18 specifies that copper foil surfaces in contact with liquid crystal polymer (LCP) insulating layers should exhibit a surface roughness (Rz) of 0.2–3.0 μm to achieve a minimum 180° peel strength of 0.5 kN/m at room temperature. This roughness range balances two competing requirements: sufficient mechanical anchoring without excessive signal loss at high frequencies (>10 GHz) due to conductor surface irregularities.
Sequential electrochemical reduction analysis (SERA) reveals that the oxide layer composition critically affects adhesion. Patent 14 demonstrates that roughened copper foil with a cupric oxide (CuO) thickness of 1–20 nm and a cuprous oxide (Cu₂O) thickness of 15–70 nm, measured at the time of thermoplastic resin bonding, provides optimal adhesion. The dual-oxide structure facilitates both chemical bonding (via Cu–O–polymer linkages) and controlled surface energy gradients that promote resin wetting during lamination.
Patent 3 introduces a hierarchical particle structure on copper foil surfaces: a primary particle layer of copper-cobalt alloy with an average size of 0.25–0.45 μm, and a secondary particle layer of copper-cobalt-nickel ternary alloy with an average size of 0.05–0.25 μm, both formed through electroplating. This dual-layer architecture enhances peel strength with liquid crystal polymer substrates while minimizing residual roughened particles on the resin surface after etching, thereby preserving circuit definition and preventing short circuits in fine-pitch applications (<30 μm pitch) 3.
The choice of polymer matrix and interfacial adhesion promoters directly determines peel strength retention under thermal and chemical stress. Patent 1 discloses a preparation method for copper clad laminate high peel strength laminate using a pre-impregnation liquid containing at least one polymer selected from fully aromatic polyesteramide, epoxy resin, and polyimide, dissolved in an organic solvent and applied to liquid crystal polymer cloth. The liquid crystal polymer employed has a melting point greater than 280°C, a dielectric constant less than 3.2, and a dielectric loss tangent below 0.0025, ensuring both high-frequency performance and thermal stability 1.
Patent 8 addresses adhesion challenges in non-roughened copper foil laminates by introducing a solvent-soluble polyimide primer layer on a thin and uniform Ni/Cr coating (Ni: 15–440 μg/dm², Cr: 15–210 μg/dm²) with a maximum coating thickness of 0.5–5 nm and a minimum thickness ≥80% of the maximum. The primer resin is a ring-closed polyimide synthesized from specific aromatic tetrabasic dianhydrides and diamines, which enhances peel strength and prevents foaming during high-temperature processing (>260°C) 8. This approach achieves high adhesion (peel strength >0.8 kgf/cm at 25°C) and heat-resistant adhesion (>0.45 kgf/cm after thermal cycling at 150°C and 240°C) while maintaining rust prevention for the copper foil 8.
Patent 6 improves adhesion by incorporating a stress relaxation filler into the insulating layer alongside conventional inorganic fillers. The stress relaxation filler is distributed throughout the resin and concentrated near the bonded interface between the insulating layer and the copper clad layer, thereby reducing interfacial stress concentration during thermal expansion mismatch and improving overall peel strength 6.
High peel strength must be maintained under thermal cycling, solvent exposure, and electrochemical etching conditions encountered in printed circuit board (PCB) manufacturing. Patent 13 reports that a copper-clad laminate with a primer layer containing Si (10–120 cps by X-ray fluorescence spectrometry) achieves a peel strength of ≥0.80 kgf/cm at 25°C and ≥0.45 kgf/cm after heat treatment at 150°C (twice) followed by 240°C for 10 minutes. This thermal stability is attributed to the formation of Si–O–polymer crosslinks that resist thermal degradation and prevent pattern exfoliation during reflow soldering 13.
Patent 12 describes a copper clad laminate for flexible printed circuit boards using low-roughness copper foil (Rz ≤1.5 μm) bonded via a 2–5 μm thick adhesive layer composed of an acid anhydride group-terminated polyimide (reaction product of aromatic tetracarboxylic acid anhydride and dimer diamine), a crosslinking agent, and an organic solvent. The insulating film has a thermal expansion coefficient of 4–30 ppm/°C at 100–200°C, closely matching the copper foil's expansion coefficient (16.5 ppm/°C), thereby minimizing thermomechanical stress and maintaining peel strength during thermal cycling 12.
Patent 18 discloses a continuous lamination process for producing copper clad laminates with liquid crystal polymer films. Copper foil is continuously superposed on one or both sides of a liquid crystal polymer film using pressure rolls heated to a temperature 5–100°C below the polymer's melting point. This temperature window ensures sufficient resin flow for wetting the copper surface without causing thermal degradation of the polymer or excessive resin squeeze-out. The process achieves a 180° peel strength of ≥0.5 kN/m and an insulating layer thickness of 10–300 μm, suitable for high-frequency circuit boards and high-density wiring applications 18.
Patent 2 describes an apparatus and method for manufacturing copper clad laminate high peel strength laminate with improved peel strength between thermoplastic liquid crystal polymer and copper foil. The process comprises three steps: (1) thinly coating the copper foil surface with a thermoplastic liquid crystal polymer solution; (2) drying the coated solution to remove the solvent; and (3) laminating and thermally pressing a thermoplastic liquid crystal polymer film onto the copper foil using heating rolls. This method ensures uniform resin distribution and eliminates voids at the copper-resin interface, thereby maximizing peel strength 2.
Patent 1 provides a preparation method involving: (1) dissolving a polymer (fully aromatic polyesteramide, epoxy resin, or polyimide) in an organic solvent, heating and stirring to obtain a pre-impregnation liquid; (2) impregnating a liquid crystal polymer cloth in the pre-impregnation liquid and drying to obtain a liquid crystal polymer impregnated cloth; and (3) laminating the impregnated cloth and copper foil to prepare the copper clad laminate. The liquid crystal polymer cloth is prepared from a liquid crystal polymer with a melting point >280°C, dielectric constant <3.2, and dielectric loss tangent <0.0025. This method achieves a simple preparation process, low manufacturing cost, and high peel strength 1.
Patent 7 addresses the challenge of achieving high adhesion strength between low dielectric resin films (dielectric constant <3.2, dielectric loss tangent ≤0.008 at 10 GHz) and copper layers while suppressing transmission losses. The method involves directly laminating an electroless copper plating layer onto at least one surface of the low dielectric resin film, eliminating the need for adhesive layers or surface roughening. The electroless plating process deposits a conformal copper layer with controlled thickness (typically 5–18 μm) and excellent adhesion, suitable for high-frequency applications where signal loss must be minimized 7.
Patent 10 describes a flexible copper clad laminate consisting of a polyimide resin layer and copper foil, where the polyimide surface is subjected to low-temperature plasma treatment, corona discharge treatment, or UV treatment. The treated surface exhibits a contact angle with water of 10°–50° and a standard deviation of the friction coefficient at 20°C of <0.02. These surface modifications increase surface energy and promote chemical bonding with adhesive layers, ensuring stable adhesion strength when the laminate is made multilayer via a bonding sheet and reducing the possibility of peeling 10.
Patent 11 discloses a flexible copper clad laminate for high-frequency applications with a stacked structure: copper foil (10) – MPI (20) – PTFE (30) – MPI (20) – copper foil (10). The surface of the MPI layer facing the PTFE layer is surface-treated through an electron beam (E-beam) process, which improves adhesion between PTFE and MPI by creating reactive sites and crosslinking at the interface 11.
Patent 4 and 15 specify that copper clad laminates with a polyimide film thickness of 5–20 μm and a copper foil thickness of 1–18 μm exhibit remarkably improved flexibility while maintaining sufficient peel strength for flexible printed circuit board applications. The thin copper foil reduces bending stiffness and allows the laminate to conform to curved surfaces without delamination 415.
Patent 16 addresses fine patternization requirements by laminating copper foil 1–8 μm in thickness with a heat-resistant carrier 10–22 μm in thickness directly onto at least one side of a polyimide layer. This configuration solves problems of insufficient peel strength, foaming, and peeling during heating, and is useful as a material for polyimide substrates in high-density interconnect applications 16.
Patent 12 emphasizes the importance of thermal expansion coefficient matching between the insulating film and copper foil. The insulating film has a thermal expansion coefficient of 4–30 ppm/°C at 100–200°C, closely matching copper's coefficient (16.5 ppm/°C). This matching minimizes thermomechanical stress during thermal cycling and prevents delamination or warping 12.
Patent 5 describes a multilayer laminate for flexible copper-clad laminates where the resin layer has a thickness of 10–30 μm, a tear propagation resistance of 100–400 mN, and a thermal expansion coefficient of ≤30×10⁻⁶ (1/K). The resin layer is formed on a copper foil with a carrier, and the carrier is peeled after lamination to obtain the flexible copper-clad laminate. This design enables minute working of ≤30 μm pitch while maintaining high resin layer strength and good handling properties in working and mounting processes 5.
Patent 17 discloses a copper clad film for manufacturing copper clad laminates, comprising a copper clad layer to be bonded to a prepreg made of an insulating material and a carrier layer made of an aluminum material. The carrier layer covers the copper clad layer to protect it during bonding and is separated from the copper clad layer when forming a circuit pattern. The copper clad layer is formed on the carrier layer by electroless plating, ensuring uniform thickness and excellent adhesion to the prepreg 17.
Copper clad laminate high peel strength laminate with low dielectric constant (<3.2) and low dielectric loss tangent (<0.0025) is essential for 5G base stations, millimeter-wave antennas, and radar systems operating at frequencies >10 GHz. Patent 1 and 7 demonstrate that liquid crystal polymer-based laminates with electroless copper plating or pre-impregnated copper foil achieve both low transmission loss and high peel strength (≥0.5 kN/m), enabling reliable signal transmission in high-frequency circuits 17.
The hierarchical copper surface structure disclosed in Patent 3 is particularly advantageous for high-frequency applications, as it minimizes etching residues that can cause signal distortion and allows for precise circuit formation with line widths <30 μm 3. The dual-layer copper-cobalt-nickel alloy particle structure ensures strong adhesion while maintaining a smooth post-etch surface, critical for impedance control in high-speed digital and RF circuits.
Flexible copper clad laminates with high peel strength are required for wearable devices, foldable smartphones, and flexible displays, where the laminate must withstand repeated bending (>100,000 cycles) without delamination. Patent 4 and 15 specify that laminates with polyimide film thickness of 5–20 μm and copper foil thickness of 1–18 μm provide the necessary flexibility and peel strength for these applications 415.
Patent 10 describes surface treatment methods (low-temperature plasma, corona discharge, UV treatment) that enhance adhesion between polyimide and bonding sheets in multilayer flexible laminates, ensuring stable adhesion strength and reducing peeling during flexing 10. The treated surface exhibits a contact angle with water of 10°–50°, indicating high surface energy and strong wetting by adhesive layers.
Automotive electronics require copper clad laminates that maintain high peel strength under thermal cycling (-40°C to 150°C) and exposure to automotive fluids (oils, coolants, brake fluids). Patent 8 demonstrates that a copper-clad laminate with a Ni/Cr coating and solvent-soluble polyimide primer layer achieves a peel strength of ≥0.45 kgf/cm after heat treatment at 150°C (twice) and 240°C for 10 minutes, meeting the stringent requirements for automotive power modules and engine control units 8.
Patent 13 reports that a copper-clad laminate with a Si-containing primer layer (10–120 cps Si by X-ray fluorescence) maintains a peel strength of ≥0.80 kgf/cm at 25°C and ≥0.45 kgf/cm after thermal cycling, preventing pattern exfoliation during reflow soldering and ensuring long-term reliability in automotive environments 13.
HDI boards require fine-pitch circuitry (<30 μm line width and spacing) and high via density (>1000 vias/cm²), demanding copper clad laminates with excellent peel strength and minimal etching residues. Patent 3 addresses this need by providing a copper foil with a dual-layer copper-cobalt-nickel alloy particle structure that achieves high peel strength with liquid crystal polymer substrates while preventing roughened particle residues on the resin surface after etching 3.
Patent 5 describes a multilayer laminate with a resin layer thickness of 10–30 μm and a tear propagation resistance of 100–400 mN, enabling minute working of ≤30 μm pitch and good handling properties in HDI board manufacturing 5. The low thermal expansion coefficient (≤30×10⁻⁶ 1/K)
| Org | Application Scenarios | Product/Project | Technical Outcomes |
|---|---|---|---|
| JX NIPPON MINING & METALS CORPORATION | High-frequency RF circuits and miniaturized electronic components requiring fine-pitch circuitry and high signal integrity in 5G base stations and millimeter-wave applications. | Liquid Crystal Polymer Copper Clad Laminate | Dual-layer copper-cobalt-nickel alloy particle structure (primary layer 0.25-0.45 μm, secondary layer 0.05-0.25 μm) achieves high peel strength with LCP substrates while eliminating etching residues, enabling circuit formation at <30 μm pitch. |
| SAMSUNG ELECTRO-MECHANICS CO. LTD. | High-frequency circuit boards and high-density wiring applications requiring robust copper-polymer adhesion under thermal cycling and chemical exposure. | Thermoplastic LCP Copper Clad Laminate Manufacturing System | Three-step coating-drying-thermal pressing process using heating rolls ensures uniform resin distribution and eliminates interfacial voids, substantially improving peel strength between thermoplastic liquid crystal polymer and copper foil. |
| TORAY ADVANCED MATERIALS KOREA INC. | Automotive electronics and high-temperature power modules requiring stable adhesion under thermal cycling from -40°C to 150°C and exposure to automotive fluids. | Si-Enhanced Primer Copper Clad Laminate | Primer layer containing 10-120 cps Si achieves peel strength ≥0.80 kgf/cm at 25°C and ≥0.45 kgf/cm after thermal cycling (150°C twice + 240°C for 10 min), preventing pattern exfoliation during reflow soldering. |
| NIPPON STEEL CHEMICAL CO. LTD. | High-frequency circuit boards operating >10 GHz and high-density wiring boards requiring low transmission loss and reliable copper-LCP adhesion for 5G communications and radar systems. | Continuous Lamination LCP Copper Clad Laminate | Continuous pressure roll lamination at 5-100°C below polymer melting point with controlled copper surface roughness (Rz 0.2-3.0 μm) achieves 180° peel strength ≥0.5 kN/m and insulating layer thickness of 10-300 μm. |
| UBE INDUSTRIES LTD. | Flexible printed circuit boards for wearable electronics, foldable smartphones, and flexible displays requiring high flexibility and delamination resistance under repeated mechanical stress. | Ultra-Thin Flexible Copper Clad Laminate | Polyimide film thickness of 5-20 μm combined with copper foil thickness of 1-18 μm provides remarkably improved flexibility while maintaining sufficient peel strength for repeated bending (>100,000 cycles). |