Title - METHOD AND SYSTEM FOR CREATING HIGH-EFFICIENCY PLASMA

Abstract

A multi-stage plasma arrangement of the chamber cross-section characterized by an upward charge movement toward the chamber's central axis through one or more boost stages that contribute to plasma heating, plasma centering on the chamber axis, and the creation of plasma rotation around it. The plasma rotation around its axis induces a self-generated magnetic field, which in turn increases plasma stability and confinement. Some of these multi-stage arrangement stages may be created by physical elements and components, while others may be induced or generated by the external application of magnetic and / or electric fields or combinations thereof, and / or by the injection of electrons, ions, or other plasma.

Description

SYSTEM AND METHOD FOR CREATING HIGH-EFFICIENCY PLASMA FIELD OF INVENTION The present invention relates to relatively small, stable linear plasma confinement systems and methods for collecting various types of products and effects derived from such phenomena. BACKGROUND OF THE INVENTION Plasma is a highly ionized gas containing approximately equal numbers of positive ions and electrons. A plasma is electrically conductive and can therefore be manipulated by electric or magnetic fields. Obtaining a stable plasma at such operating temperatures is a much-analyzed challenge in the field. Current systems and methods for this purpose are complex, require very large physical facilities, and lack readily available commercial means to harness the well-known benefits and advantages of such phenomena. Since plasma is an electrical conductor, it is possible to heat it by inducing a current through it; the induced current that provides most of the poloidal field is also a significant source of initial heating. The heating caused by the induced current is called ohmic (or resistive) heating. The heat generated depends on the plasma's resistance and the amount of electric current passing through it. However, as the temperature of the heated plasma increases, the resistance decreases, and ohmic heating becomes less effective. 1727054 of 25 A large number of plasma sources have been suggested and developed. These sources differ in their methods of plasma excitation, electrode geometry, and plasma volume, which in turn determine the main plasma parameters. Some of these methods and systems consist of various gaseous components and mixtures thereof as an ion source which, when combined with energy sources, creates an ionized gas that is guided or confined by magnets or other suitable means to create a magnetic field. In this field, the ions are energized to the energy required for the intended reaction. This energy can be obtained in the prior art by different combinations of electric or magnetic fields, electrode arrangements, and the like. This process creates emissions such as X-rays, extreme ultraviolet radiation, neutrons, and the like. The following are some terms and phenomena recognized in the relevant art: Pinch: A current in the plasma can create a field strong enough to self-confine the plasma, reducing or completely eliminating the need for external magnets. The ability to pinch the plasma allows a cylindrical shape to be substituted for a toroidal one. Instead of a large toroid, the current could simply be induced in a linear tube, causing the plasma inside to collapse into a filament. This has the advantage that the current in the plasma would heat it through normal resistive heating, but in the prior art, this configuration is considered to be considerably limited in the achievable plasma temperature. However, as the plasma collapses, the adiabatic process would result in a dramatic increase in temperature. Another way 1727054 of 25. Creating a pinch is achieved by increasing the magnetic field with a very high current pulse within the coils that generate the magnetic field. This pinch increases the pressure on the plasma and, therefore, increases the plasma density. Magnetic compression: A gas can be heated by sudden compression. Similarly, the temperature of a plasma increases if it is rapidly compressed by increasing the confining magnetic field. Since plasma compression brings ions closer together, the process has the added benefit of facilitating the achievement of the required density. Magnetic compression is known in the art to have been implemented to a limited extent in the ATC (Adiabetic Toroidal Compressor), although the concept has not been widely used since then. Plasma stability: Plasma can be subject to perturbing forces that can affect its equilibrium. In a stable plasma, such perturbations will dampen or cancel each other out, resulting in the stability of the plasma parameters—stability for a certain period of time. To increase plasma stability in FRCs (Field Reverse Configurations, where high energy produces kinetic effects), a stabilized pinch was conceptualized: this concept added extra magnets to the outside of the chamber, creating a field that would be present in the plasma before the pinch discharge. In most concepts, the external field was relatively weak, and because plasma is diamagnetic, the external magnetic field only penetrated the outer areas of the plasma. When the pinch discharge occurs and the 1727054 of 25 plasma contracts rapidly; this field freezes into the resulting filament, creating a strong field in its outer layers. This is also called giving the plasma a backbone. In the toroidal configuration, stabilization was slightly different: the design would be the same as in the pinch-stabilized configuration, but the roles of the two fields would be reversed. Instead of weak external fields providing stabilization and a strong pinch current responsible for confinement, in the new design, the external magnets would be much more powerful to provide most of the confinement, while the current would be much smaller and responsible for the stabilizing effect. FRC: Inverted Field Configurations: The moving current generates a magnetic field around it. This magnetic field can contain the current. Inverted field configurations are charged plasma loops. They create their own magnetic fields, containing themselves. Inside the loop, the plasma density is higher. An FRC is a structure made of plasma. FRCs can be obtained in both toroidal and linear machines. Several approaches are known for obtaining FRCs in linear machines. One such approach is by reflecting magnetic field ions off the corresponding ends of a linear machine, causing plasma to bounce back and forth between the bundled ends, thus forming an FRC in the middle of the machine. The two magnetic mirrors at the ends of the linear chamber face each other while a rotating magnetic field is applied to the outside of the tube chamber. This arrangement 1727054 of 25 attracts electrons in the plasma, creating a current that in turn generates a magnetic field that forms an FRC in the middle of the plasma. Another approach would be to fire two neutral gas beams into the center of the cylindrical chamber at a slight angle, which would eventually cause the plasma to rotate and create a far-reaching collision (FRC). These beams also heat the plasma through collisions and ionize it, further increasing its density. Current known solutions for creating efficient and stable collectable plasma present many problems and limitations. For example, it is known that energy can sometimes escape in large bursts. Furthermore, in such situations, current is induced by continuously increasing the current through an electromagnetic winding linked to a plasma torus: the plasma can be viewed as the secondary winding of a transformer. This is inherently perceived as a pulsed process because there is a limit to the current through the primary (there are also other limitations on long pulses). Therefore, current known systems must operate for short periods or rely on other means of heating and current conduction. A drawback of these systems is that a sudden surge or heat loss can destroy a component.Such accidental losses cannot be tolerated in a complex, costly, and sometimes dangerous system. Another drawback of the technique is the physical size of the actual system required to produce plasma. Toroidal design systems, as well as some currently designed linear machines, present challenges in obtaining plasma products at scale. 1727054 of 25 Stability is a prerequisite for effective plasma generation and collection processes. Current designs of both toroidal and linear machines present challenges in achieving the desired stability. It is well known that axisymmetric linear systems can exhibit relatively higher plasma stability due to their symmetry; however, currently designed linear systems are heated by indirect methods (such as ion beams, RF antennas, and lasers), which adversely affects plasma heating efficiency. These indirect methods require high levels of input energy, negatively impacting the overall system efficiency. Although relatively small axial cylindrical inertial electrical confinement devices are known in the art, such devices are not considered advantageous for plasma collection but, in any case, are suitable for other technical tasks such as X-ray sources ('A Portable Neutron / tunable X-ray source based on inertial electrostatic confinement', Nucl. Instrum. Meth. Physics Res. A 422, 16-20, 1999). There is an additional need to provide a system and method configured to address and mitigate these drawbacks and provide additional benefits. SUMMARY OF THE INVENTION The present invention provides a system and method for creating a local self-generating magnetic field arranged to contribute to a substantially stable plasma and ion heating mechanism. Various combinations of this arrangement facilitate 1727054 of 25 high-efficiency plasma processes (such as neutron sources, extreme ultraviolet, etching process, etc.). The present invention substantially introduces the following aspects: plasma confinement; heating of ions and / or electrons in plasma; increased plasma density; high or extremely high plasma stability; highly stable plasma for relatively long periods of time (milliseconds); and a mostly axially symmetric chamber design. A relatively stable plasma over the long term is referred to herein as SSCP (Super Stable Confined Plasma). The implementation of various combinations, partially or completely, of these aspects of the present invention facilitates efficient, economical, and highly scalable plasma and / or ion heating processes. The present invention describes a system and method for providing a multi-stage plasma arrangement of the chamber cross-section characterized by an upward charge movement toward the central axis of the chamber through one or more boost stages that contribute to plasma heating, plasma centering on the chamber axis, and plasma rotation thereon. The plasma rotation around its axis induces a self-generated magnetic field, which in turn increases the stability and confinement of the plasma (similar to the well-known toroidal pinch effect). Some of these multi-stage arrangement stages can be created by physical elements and components, while others can be induced or generated by the external application of magnetic and / or electric fields or combinations thereof, and / or by the injection of electrons, ions, or other plasma. 1727054 of 25 The following embodiments and aspects thereof are described and illustrated, along with systems, devices, and methods intended to be exemplary and illustrative, without limiting their scope. In several embodiments, one or more of the problems described above have been reduced or eliminated, while other embodiments are aimed at other advantages or improvements. BRIEF DESCRIPTION OF THE FIGURES Some embodiments of the invention are described herein with reference to the accompanying figures. The description, together with the figures, makes it clear to a person skilled in the art how some embodiments can be implemented. The figures are for illustrative purposes and are not intended to show details of an embodiment in more detail than is necessary for a fundamental understanding of the invention. In the figures: FIG. 1 is a schematic view of the high-efficiency plasma system, according to some embodiments of the invention. Figures 2A-2B are schematic views of the high-efficiency plasma system chamber, according to some embodiments of the invention. Figures 3A-3B are schematic views of the ionization stages in the reaction area of ​​the high-efficiency plasma system chamber, according to some embodiments of the invention. 1727054 of 25 FIG. 4A represents the axial section of the Particle Cell simulation results of ion acceleration in the reaction area of ​​the high-efficiency plasma system chamber, according to some embodiments of the invention. FIG. 4B represents the axial section of the Particle Cell simulation results of electron acceleration in the reaction area of ​​the high-efficiency plasma system chamber, according to some embodiments of the invention. FIG. 4C represents the cross-section of the Particle Cell simulation results of the radial direction velocity of ions in the reaction area of ​​the high-efficiency plasma system chamber, according to some embodiments of the invention. FIG. 4D represents the cross-section of the Particle-in-Cell simulation results of the phi direction velocity of the ion in the reaction area of ​​the high-efficiency plasma system chamber, according to some embodiments of the invention. Figures 5A-5B are schematic examples of magnetic and electric fields that can be obtained with the operation of the high-efficiency plasma system and method, according to some embodiment of the invention. FIG. 6A is a photographic image of a test apparatus according to some embodiment of the invention showing the reaction area of ​​the high-efficiency plasma system chamber looking along the camera axis line, demonstrating plasma circulation in a lower magnetic field. 1727054 of 25 FIG. 6B is a photographic image of a test apparatus according to some embodiment of the invention showing the reaction area of ​​the high-efficiency plasma system chamber looking along the camera axis line, demonstrating plasma circulation in a higher magnetic field. FIG. 7 is a graph of voltage measured on probes used in a test apparatus according to some embodiment of the invention versus externally applied voltage values. Figures 8A-8G show examples of electrode design according to some embodiments of the invention. FIG. 9 constitutes a schematic example of obtaining the ion reflection obtainable by the operation of the high-efficiency plasma system and method, according to some embodiment of the invention. Figures 10A-10D show examples of mesh cylinder design according to some embodiments of the invention. DETAILED DESCRIPTION OF SOME REALIZATIONS AND EXAMPLES The following detailed description sets forth numerous specific details to provide a complete understanding of the invention. However, those skilled in the art will understand that the present invention can be implemented without these specific details. In other instances, well-known methods, procedures, and components, modules, units, and / or circuits have not been described in detail so as not to obscure the 1727054 of 25 invention. Some features or elements described with respect to one embodiment may be combined with features or elements described with respect to other embodiments. For the sake of clarity, the analysis of identical or similar features or elements may not be repeated. Although embodiments of the invention are not limited in this respect, analyses using terms such as, for example, “control, process, compute, calculate, determine, establish, analyze, verify,” “configure,” “receive,” or similar terms, may refer to operations and / or processes of a controller, computer, computing platform, computer system, or other electronic computing device that manipulates and / or transforms data represented as physical quantities (for example, electronic) within the registers and / or memories of the computer into other data similarly represented as physical quantities within the registers and / or memories of the computer or other non-transient information storage medium that can store instructions for performing operations and / or processes. The term controller, as used in this document, refers to any type of computing platform or component that can be provisioned with a Central Processing Unit (CPU) or microprocessors, and can be provisioned with various Input / Output (I / O) ports, for example, a general-purpose computer such as a personal computer, laptop, tablet, mobile cell phone, controller chip, SoC, or cloud computing system. 1727054 of 25 Unless explicitly stated otherwise, the method realizations described herein are not restricted to any particular order or sequence. Furthermore, some of the described method realizations or elements thereof may occur or be performed simultaneously, at the same time, or concurrently. According to one aspect of the invention, an axially symmetrical form of the plasma is held stable and coaxial by a combination of some or all of the following analyzed system components or elements, as exemplified schematically in Fig. 1, which consists substantially of - (i) a cylindrical chamber (100) having a substantially reduced internal pressure; (ii) inner anode element (145) (iii) an electrode (140) placed at each end of the tubular chamber connected to an external power supply; (iv) external solenoids or magnets or a combination thereof (160); (v) capacitor banks (for e / m pulses) external to the camera (800); (vi) control unit (500); (vii) very high quality vacuum pumping system (typically 10 -3- 107Torr) (600); (viii) Preheating power supply (700). (ix) working gas source (900) coupled with a control valve (920) connected to a gas inlet (910). Reference is made to Fig. 2A in which the tubular chamber (100) is optionally combined with an internal anode element (145) (close to the inner skin of the chamber), as an initial external stage to the cascading internal stages of magnetic fields and 1727054 of 25 internal and external induced or generated magnetic fields. Reference is also made to Fig. 2B in which the optional electrodes (140) at the ends of the tubular chamber act as cathodes in the ionization process. In one embodiment, at least one internal tubular electric field is created by a conducting apparatus (135) or by virtual induced plasma (130) arranged concentrically on the axis of the tubular chamber, wherein said internal field acts as a cascade stage that manipulates ionization. Figure 3A shows the facilitation of the external ionization (OIS) stage (300) which contributes to a high ionization rate of the working gas originating from the working gas source (900) injected in a controlled manner into the chamber (100) through the control valve (920) via the gas inlet (910). This ionization is due to the relatively high electric field (typically ~2-7 kV but also much larger ranges such as ~2-20 kV or even higher) in the external cascade.The coupling of this ionization with the rotation of electrons around the chamber axis (110) due to the externally applied electric field (from the preheating power supply (700)) and the magnetic field (via a magnetic coil or solenoids (160) coupled with a capacitor bank (800)) contributes to the heating of the ions in the OIS (300) and their acceleration towards the chamber axis (110). This acceleration, which itself contributes to the magnetic field gradient, leads to ion compression in and around the chamber axis (110) and thus contributes to the creation of stable plasma (130) in the reaction area (170), according to the directions of the control unit (500). With reference to Figure 3B, which illustrates the facilitation of an embodiment in which at least two additional internal tubular electric fields are created by means of a conducting apparatus (135) or by means of... 1727054 of 25 Virtual plasma induction arranged concentrically on the axis of the tubular chamber (110), these internal fields act as additional cascade stages manipulating ionization through the external ionization stage (OIS) (300) and the main reaction stage (MRS) (200). The upper portions of the cascade stages, the OIS, contribute to a high ionization rate of the working gas. This ionization is due to the relatively high electric field (typically ~2-7 kV but also much larger ranges such as ~2-20 kV or even higher) generated in the external cascade. The electric field in the internal cascade stage, in the MRS, must be of a much higher magnitude (typically ~10-35 kV, but also much larger ranges such as ~10100 kV or even higher). These arrangements result in electrons being emitted from said optional electrodes (140) at the ends of the tubular chamber to create a virtual cathode (130) on the axis of the tubular chamber, affected by externally applied magnetic and electric fields coupled to the internally generated magnetic and electric fields; causing magnetic and electric forces on the gas ions, according to the directions of the controller. As can be demonstrated in Fig. 4A to Fig. 4D, which represent certain particle-in-cell (PIC) simulation results performed according to some embodiments of the invention. Those skilled in the art understand that PIC simulations are acceptable research and demonstration techniques for plasma simulation. Fig. 4A shows the PIC simulation results of ion acceleration in the radial direction of the chamber (100), while Fig.Figure 4B shows the confinement of electrons in two stages of the potential well: in area (401) near the chamber wall; and in area (402) of the chamber axis (110). Fig. 4A and. Figure 4B, section 1727054, illustrates the phenomenon that ions are less affected by the magnetic field in proportion to their mass, which is much greater than that of electrons. Therefore, this arrangement would facilitate the movement of ions between areas (401) and (402), as shown in Figure 4A, while electrons remain substantially located in areas (401) or (402), as shown in Figure 4B. This PIC simulation demonstrates the facilitation of the OIS (300) and the virtual cathode (130) on the axis of the tubular chamber created by the MRS (200). The radial direction velocity of ion (i) characteristic of ion motion is shown in Fig. 4C and the (rotational) Phi direction velocity of ion (i) in Fig. 4D, both shown against the stalled electrons (e) in areas (401) and (402) respectively.An expert in the technique will understand that such PIC simulations demonstrate the increase in ion speed, both radially and rotationally, which is indicative of the high ion temperature that can be obtained in the area of ​​the chamber axis (110) in such an arrangement. According to some embodiments, a cylindrical chamber is used to encapsulate the process. The chamber walls can be made of various materials (ranging from metals, ceramics, Pyrex, glass, and others). Different materials may have different advantages or disadvantages in terms of strength, heat transmission, insulation, radiation transparency, opacity, and other characteristics. According to some embodiments, the chamber walls are conducive to and can act as an electrode (145) or as a stage in the cascade of magnetic and electric fields. According to some embodiments, the cylindrical chamber (100) is initially depressurized to a large extent to very high quality vacuum conditions (characteristically 10-3 - 10 7 Torr) before the injection of gas through the connected gas inlet (910) 1727054 of 25 to a control valve (920) to prevent interference / contamination by unwanted particles of residual gases. According to some embodiments, the cylindrical chamber is filled with a working gas (xenon / argon / hydrogen / deuterium / or other relevant gases or combinations thereof depending on the plasma process to be implemented) at a predefined pressure. The gas particles in the chamber are ionized and effectively manipulated by applied electric and magnetic fields arranged according to the invention. According to some embodiments, the outer circumference of the cylindrical chamber (100) contains an active conductive component that acts as an anode, enabling the induction of a high-voltage radial electric field that ionizes the gas in the chamber. Referring to Figs. 2A and 2B, this outer chamber component (100) is the first stage of the multi-stage anode arrangement, an example of which is shown in Fig. 2, comprising several plasma stages, some of which may be physical and others virtually induced. According to some embodiments of the invention, with reference to Fig. 3, these stages are arranged radially with respect to the axis of the chamber (110), each stage accelerating the ions toward the central axis in the area where the plasma is concentrated (130). A person skilled in the art will appreciate that ion acceleration can be achieved using various magnetic and electric fields and their combinations. By way of non-limiting example, and referring to Fig. 1, according to some embodiments, the reaction area (170) of the chamber circumference (100) is surrounded by a magnet or magnetic coil (160) of relatively low to medium power (typically of a magnitude of ~0.1–0.5 Tesla or greater, such as ~0.1–2 Tesla). According to some embodiments, this magnetic resonance system (MRS) is evident at the longitudinal center of the chamber, and according to other embodiments, the active part (170) can 1727054 of 25 extend to the ends of the tubular chamber (100) as in the area of ​​the electrodes (140). Substantially, this arrangement allows the application of a current pulse to the coil which causes a magnetic pulse that in turn causes the plasma in the chamber to compress and heat up for greater efficiency of the plasma processes. According to some implementations, the system's maintainability is improved due to its relatively small size. The pulse-operated system benefits from an extended service life of materials that would otherwise deteriorate with continuous operation, thus reducing MTBF and the need for replacements. According to some embodiments, a multi-stage ionization is described in Fig. 3A showing the internal area in which the distal axial edge of the cylindrical grid element or virtual mesh grid acts as the boundary and the cathode of the external ionization stage (OIS) increases the plasma ionization level in the chamber, eventually increasing the ion flow towards the cylinder axis. According to some embodiments, a multi-stage ionization process is described in Fig. 3B, which shows the internal area where the distal axial edge of the cylindrical grid element or virtual mesh grid acts as the boundary and cathode of the outer ionization stage (OIS). This stage increases the plasma ionization level in the chamber, ultimately increasing the ion flow toward the material cathode or virtual cathode that passes through the main reaction stage (MRS) on the cylinder axis. According to some embodiments, as described in Fig. 3A, the formation of the MRS and the virtual cathode coincides, thus increasing the ion density on the axis and creating a higher probability of reaction between the accelerated ions from the OIS stage and the ions in the combined volume. 1727054 of 25 MRS and virtual cathode. The ions that pass under such conditions (according to Fig. 3A or Fig. 3B) contribute to the creation of the designated plasma processes. According to some embodiments, the internal volume where the plasma is concentrated is surrounded by an internal metal grid cylinder (135) (substantially less than 15% mesh density and typically less than 5% mesh density). The metal grid cylinder can be made of various materials (such as any conductive material that can withstand heat and has little absorption of water or other substances and does not contaminate the chamber, such as stainless steel, tungsten, molybdenum, and other materials) and have various shapes and patterns (such as helical spring shape, perforated, slotted, solid, grooved, etc., as some examples of which are shown in Figs. 10A to 10D) (such an internal cylindrical element will hereafter be referred to as the mesh cylinder or cylindrical grid element). According to some embodiments, instead of or in addition to the cylindrical grid element, an electromagnetic field can be generated locally that produces an effect similar to that of a mesh cylinder (135) by manipulating the multi-stage anode arrangement. According to some embodiments, these cylindrical grid elements also serve as an anode for the MRS. The result is a cascade of stages, the first of which is the outer chamber cylinder acting as the anode, followed by the cylindrical grid element as the anode. The next stage is a material cathode or a virtual cathode on the axis of the chamber cylinder in the plasma area, whose cathodic characteristic results from the application of the preceding stages coupled to the emission electrodes of 1727054 of 25 electrons at the ends of the active tubular chamber. The cross product of the linear magnetic field flux in the chamber with a radial electric field inside the chamber results in the creation of a strong internal magnetic field, as exemplified schematically in Fig. 5A. This self-induced magnetic field (301) has closed field lines within the chamber. This cross product contributes to the contortion and coaxialization of the plasma without substantially additional energy investment. Adjusting and optimizing the electric and magnetic fields and their cross product creates strong confinement and thus yields a high-pressure, high-density, and high-stability plasma (similar to the conventional FRC effect). According to some embodiments, referring to Fig.5B, whereby an additional external magnetic pulse 302A (typically of magnitude 3-10 Tesla or greater) would increase the induced current, which is the product of the external magnetic field pulse (302A) and the external electric field, apparent on the camera axis (110), thus contorting the axial plasma and contributing to an SSCP effect, exhibiting a longitudinal concentration of induced magnetic field (301A). This effect is also evident in the photographic images of a test apparatus in operation arranged according to the invention, shown in Fig. 6A and Fig. 6B. Fig. 6A and Fig. 6B are photographic images of a system according to the invention showing the plasma circulating around the camera axis under different external magnetic field applications. Evidently, the plasma radius (300B) is larger under the stronger externally applied magnetic field and smaller (300A) under a weaker externally applied magnetic field.An expert in the field would appreciate that the rotational energy is effected by the external radial electric field and its product with the external magnetic field (ExB) in the z (axial) direction. This change in the external magnetic field would characteristically contribute in a dominant way to the creation of the SSCP effect as shown. 1727054 of 25 visually demonstrates in the plasma contortion shown in Fig. 6A and Fig. 6B. Furthermore, a person skilled in the art would appreciate that the application of a strong external magnetic field pulse will create an effect substantially equivalent to a pinch, compressing and overcoming the centrifugal forces of the plasma, thereby causing the plasma to heat up and increasing the plasma density in the MRS, bringing the plasma to high energy parameters. An example of obtaining such energy parameters is shown in Fig. 7, which presents a graph of voltage measured on probes versus externally applied voltage values ​​according to a test apparatus according to some embodiment of the invention. The test apparatus consisted of two Langmuir probes, one located in the lower OIS area and the other in the upper part of the MRS area. The probes measured the electrical potential of the plasma. Fig.Figure 7 shows the high correlation between the application of various heating / acceleration voltages to the measured plasma voltage indicating the actual plasma heating in the MRS (200). The acceleration of ions produces a temperature increase. This acceleration is a direct result of the static electric field, which is considered an efficient method for providing kinetic energy to a charged particle. According to some implementations, the use of a radial electric field creates an inherent axisymmetric heating mechanism with a high degree of uniformity, maintaining the axial symmetry crucial for plasma stability. A person skilled in the art would appreciate that the plasma density can be increased by injecting additional gas into the chamber. According to some embodiments, gas injection can be achieved through the cylinder wall (100) by means of a gas inlet connected to a proportional valve (920). Control of gas injection through 1727054 of 25 of the chamber wall can further contribute to the efficient distribution of the charged gas by influencing the density outflows in the chamber volume. According to some embodiments, electrodes (made of high-temperature resistant materials such as tungsten / molybdenum / or similar) are placed coaxially at the ends of the tubular chamber and connected to a high-voltage negative electrical load. Such designs can be used to contribute to the electric field potential on the chamber axis and / or to facilitate a source of electron emission. According to some embodiments, such electrodes can be passive, in which the plasma itself heats from the electrode tip (141), or active, in which heating is induced externally in the electrode and thus actively causes electron emission from the active electrode tip (141') (creating an electron gun). According to some embodiments, these electrodes are characterized by a design of variable gradients and / or gradually changing radii and / or variable planes comprising several phases of different magnitude scales. Reference is made to Figures 8A to 8G, which show some of these electrodes. According to some embodiments, the electrodes shown in Figures 8B and 8F can be characterized by three main areas of these phases: a relatively large magnitude phase (143); a mid-section phase that tapers toward the tip (142); and a tip-section phase (141). According to other embodiments, additional alternative electrode designs can be implemented (as shown in Figures 8A, 8C, 8D, and 8E). Reference is made to Figure 8G, which shows another electrode design combined with an internal heating element (147) that, when heated, causes a high rate of electron emission from the electrode tip (141). 1727054 of 25 With reference to Fig. 9, an active electrode emits electrons from the active tip (141). This active emission is achieved by means of the external heating element (700). The heat concentrated at the tip (141) causes the emission of electrons in a thermionic emission process. Thus, according to some embodiments of the invention, the emitted electrons are forced longitudinally by the electric field and retained by the magnetic field towards the center of the chamber, thereby contributing to the creation of an initial virtual cathode (130) and subsequently maintaining it in a substantially stationary state. According to some embodiments, the shape and structure of the electrodes immersed within the chamber volume creates an electron gun source. According to some embodiments, the shape and structure of the electrodes immersed within the chamber volume creates an electric mirror or electric deflector obtained by means of specific geometric shapes unique to the invention, as in Fig. 8A through 8G. Therefore, a person skilled in the art would appreciate that such effects can be obtained by means of other specific multiphase electrode designs according to the invention. By way of non-limiting example, reference is made to Fig. 9, which shows the electric field mirror (171) created by placing the coaxially immersed electrode (140) in the chamber (100) aligned with its axis (110). In this example, the plasma phase at its distal ends in the area of ​​the electrode tip (141), placed at each end of the chamber, accumulates a volume of ions. Referring to Fig. 9, the ion clouds (151), (152), and (153) that are not captured in the main plasma flow have a containment effect on the plasma and chamber shapes. These clouds are considered to have a reflection restriction effect whereby the ions on their trajectory toward the ends of 1727054 of 25 The tubular chamber is contained by the electron cloud (as shown schematically in Fig. 9). According to some embodiments, this reflection is obtained by combining the multi-stage cascade arrangement in the chamber with these multi-stage electrodes, without installing actual magnets at the ends of the linearly designed chamber to obtain a magnetic mirror effect, as might be suggested in other cylindrical designs. According to some embodiments, it is sufficient to rely on the emission of electrons from the distal plasma electrode stage. The axial location of the ion mirror will vary according to many parameters, including the actual design of the electrode stages, but in any case, it is a distance that creates the equilibrium between ions and electrons that ultimately establishes the ion mirror. According to some embodiments, electron-emitting electrodes are characterized by having at least two phases in which the arrangement of the phases is designed to induce clouds of ions and electrons in the vicinity of the electrode, in which at least one phase has a considerably larger diameter compared to the other phase of the electrode. According to some embodiments, electron-emitting electrodes are characterized by having at least two phases, so the arrangement of the phases is designed to induce clouds of ions and electrons in the vicinity of the electrode, so that through some of the phases the electric current is conducted and others are electrostatically charged. According to some embodiments, the electron-emitting electrodes are arranged so that they generate electrical mirrors within the chamber that substantially reduce ion escape at the ends of the tubular chamber. 1727054 of 25 The operation of the currently envisioned system requires a relatively small energy input from external sources (compared to conventional systems) for both heating and magnetic field accumulation. A person skilled in the art would appreciate that implementing the unique design criteria derived from the approaches described earlier in this document will result in a highly efficient system. Without limitation of any of the foregoing, a person skilled in the art would appreciate that the collectable plasma that can be obtained according to the suggested system and method can be used as a neutron source, as an extreme UV source, in an etching process, energy harvesting and / or generally in or for high-temperature, high-density plasma fusion processes. Although the present invention has been described with reference to specific embodiments, this description is not intended to be interpreted in a limited sense. Several modifications of the described embodiments, as well as alternative embodiments of the invention, will be apparent to those skilled in the art with reference to the description of the invention. It is therefore contemplated that the appended claims will cover such modifications that fall within the scope of the invention.

Claims

1. A high-efficiency plasma creation method including a method for generating a virtual cathode along the central axis of a cylindrical chamber and stably confining the plasma contained therein, characterized in that it comprises the steps of: (a) producing a vacuum in a cylindrical chamber; (b) injecting a gas into the cylindrical chamber; (c) applying a magnetic field around a portion of the cylindrical chamber; (d) applying an initial electric potential between at least one physical anode, wherein at least one of said physical anode is configured around the central axis and proximal to a first distal end thereof, and a physical cathode configured on the central axis and at a second distal end, thereby producing an initial generally radial electric field; (e) generating a plasma within the cylindrical chamber;(f) generating an axially symmetric plasma region in which the motion of the plasma about the central axis in the presence of said magnetic field and said initial electric field produces a net negative charge and thus a virtual cathode and thus a secondary electric potential and therefore a secondary electric field; and (g) further heating and confining the plasma about the central axis, wherein a plasma is generated in a cylindrical chamber in which a magnetic field and an initial electric potential are also generated, and wherein a virtual cathode is thus generated from an axially symmetric plasma region about the central axis, and wherein the plasma in the cylindrical chamber is further heated and confined by said virtual cathode, and wherein steps (d) and (e) can be taken in any order between steps (c) and (f). Thirteen claims follow;