Magnetron-zerstäubungsvorrichtung mit hoher geschwindigkeit

Abstract

The invention relates to the technique of vacuum deposition of metal and ceramic coatings, in particular to a device for high-rate magnetron sputtering, and can be used in the manufacture of products with coatings of metals, glass, polymer films and fabric. The device for high-rate magnetron sputtering includes the main elements of the magnetron: anode 1, cathode, magnetic system 3. The magnetron cathode is water-cooled and the coolant is supplied to the cooled surface of the target 9 of the magnetron through an opening in the central pole 6 of the magnetic system, at the end of which there is a radial manifold with slots in the form of flat nozzles designed for sputtering at their outlet of the coolant in the form of a high-speed stream from separate jets, and draining 11 the coolant from the cooled cavity 12 into the atmosphere through a system of holes in the spacer insert 13, wherein the pressure of the coolant in the cooled cavity 12 of the body 2 of the magnetron cathode drops from 4-6 atm at the inlet of the coolant 10 to 0.8-1.2 atm at the drain of the coolant 11. Such a stream in the form of high-speed jets of the coolant contributes to effective cooling of the sputtering target and provides favourable conditions for input of high power into the plasma discharge of the magnetron, which significantly increases the rate of sputtering / deposition of coatings compared to the conventional magnetron.