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Nanometer multilayer hard AlN/SiO2 film

A nano-multi-layer, hard technology, applied in the direction of coating, metal material coating process, gaseous chemical plating, etc., can solve the problems of hardness decrease and affect the coating function, etc., and achieve high hardness mechanical properties and excellent mechanical properties , the effect of great application value

Inactive Publication Date: 2008-04-16
SHANGHAI JIAOTONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Although the above-mentioned oxide-containing coating greatly improves the high-temperature oxidation resistance of the coating, its hardness decreases, which affects the effective function of the coating.

Method used

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  • Nanometer multilayer hard AlN/SiO2 film

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Comparison scheme
Effect test

example 1

[0018] AlN / SiO of the present invention 2 The specific process parameters of the manufacturing method of the multilayer film are: Al target sputtering power is 200W, deposition time is 12 seconds, SiO 2 The target sputtering power is 60W, the deposition time is 4 seconds, and the substrate temperature is room temperature. The resulting AlN / SiO 2 The thickness of the AlN layer in the multilayer film is 3.0nm, SiO 2 The layer thickness was 0.6 nm, and the hardness of the film was 29.5 GPa.

example 2

[0020] AlN / SiO of the present invention 2 The specific process parameters of the manufacturing method of the multilayer film are: Al target sputtering power is 200W, deposition time is 12 seconds, SiO 2 The target sputtering power is 90W, the deposition time is 4 seconds, and the substrate temperature is room temperature. The resulting AlN / SiO 2 The thickness of the AlN layer in the multilayer film is 3.0nm, SiO 2 The layer thickness was 0.9 nm, and the hardness of the film was 32 GPa.

example 3

[0022] AlN / SiO of the present invention 2 The specific process parameters of the manufacturing method of the multilayer film are: Al target sputtering power is 200W, deposition time is 20 seconds, SiO 2 The target sputtering power is 40W, the deposition time is 4 seconds, and the substrate temperature is room temperature. The resulting AlN / SiO 2 The thickness of the AlN layer in the multilayer film is 4.2nm, SiO 2 The layer thickness was 0.4 nm, and the hardness of the film was 28 GPa.

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Abstract

The present invention is one kind of nanometer multilayer hard AlN / SiO2 film and belongs to the field of ceramic film technology. The nanometer multilayer hard AlN / SiO2 film of the present invention consists of 3-6 nm thick AlN layers and 0.4-1.2 nm thick SiO2 layers deposited alternately onto metal or ceramic base. Structurally, the nanometer multilayer hard AlN / SiO2 film has crystallized SiO2 to form superlattice columnar crystal with AlN. The nanometer multilayer hard AlN / SiO2 film of the present invention has not only excellent high temperature resistance but also high hardness, higher than 28 GPa and up to 32 GPa. The present invention has high application value in being applied as the coating for high speed cutter and high temperature antiwear workpiece.

Description

technical field [0001] What the present invention relates to is a kind of ceramic film, especially a kind of AlN / SiO 2 The nanometer multilayer hard film is used in the technical field of tool coating film. Background technique [0002] Due to its high machining efficiency and less environmental pollution, high-speed cutting and dry cutting have become the mainstream of cutting technology development. This processing technology puts forward higher requirements on the performance of the tool coating, which not only requires the tool coating to have high hardness, low friction coefficient, but also high oxidation resistance. Existing tool coatings have not yet been able to meet the above stringent requirements. For example, the hardness of TiN coating is HV23±2GPa, and the oxidation temperature is about 500°C; the hardness of TiCN coating is as high as HV40, but the oxidation resistance temperature is only 400°C; the current best TiAlN coating has a hardness of HV35±5GPa, an...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C04B41/89C23C16/34C23C16/40
Inventor 李戈扬赵文济孔明戴嘉维
Owner SHANGHAI JIAOTONG UNIV