Structure for increasing reliability of metal connecting line
A metal connection, reliability technology, applied in nonlinear optics, optics, instruments, etc., can solve problems such as insufficient capture rate of conductive particles
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[0031] Please refer to FIG. 2 and FIG. 3 at the same time. FIG. 2 shows a plan view of a preferred embodiment of the structure for increasing the reliability of the metal connection according to the present invention. Fig. 3 is a sectional view along line 3-3' of Fig. 2 . A plurality of metal bumps 202 are located on a first substrate 204 such as a semiconductor substrate. In this preferred embodiment, the semiconductor substrate 204 is a silicon chip, and the metal bumps 202 are preferably composed of gold, which is formed on silicon Metal electrodes (not shown) of the chip are connected to the chip 204 , and the metal bump 202 has a plurality of grooves 206 on the other surface facing away from the first substrate 204 . The grooves 206 are preferably rectangular or square, and arranged in a matrix to form a grid-like metal bump 202 . It should be noted that the shortest side of the rectangular groove 206 needs to be longer than the diameter of the conductive particles 208 o...
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Abstract
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