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Side chain unsaturated polymer, radiation sensitive resin composition and spacer for liquid crystal display element

A technology of liquid crystal display element and resin composition, which is applied in nonlinear optics, optics, instruments, etc., and can solve the problems of limited addition amount, larger plastic deformation, and uneven display.

Inactive Publication Date: 2009-02-11
JSR CORPORATIOON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] However, when using the ODF method, it is necessary to press the thin-film transistor (TFT) array and the color filter at room temperature. If the plastic deformation of the separator due to the compressive load becomes large, the cell gap cannot be guaranteed. Uniformity, there is a gap inside the box, which causes the uneven display.
[0009] Therefore, there is a need for a separator that is difficult to plastically deform and has a high recovery rate even if it is deformed by a compressive load. For example, JP-A-2003-173025 proposes a separator containing A polymer obtained by reacting a copolymer of a monomer and a (meth)acrylic monomer and a hydroxyl-containing monomer with an isocyanate compound containing an ethylenically unsaturated bond, and a thermally crosslinkable photosensitive resin containing an epoxy group compound The separator composed of the composition is generally considered to have high sensitivity and excellent elastic properties. However, the photosensitive resin composition contributes to the thermal crosslinking that improves the heat resistance from the viewpoint of the developability of the alkali aqueous solution. The addition amount of the epoxy group-containing compound is limited, so there is a problem that the heat resistance of the obtained separator may not be able to meet the requirements.

Method used

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  • Side chain unsaturated polymer, radiation sensitive resin composition and spacer for liquid crystal display element
  • Side chain unsaturated polymer, radiation sensitive resin composition and spacer for liquid crystal display element
  • Side chain unsaturated polymer, radiation sensitive resin composition and spacer for liquid crystal display element

Examples

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Embodiment

[0218] The following examples are listed to more specifically illustrate embodiments of the present invention. Parts and % are based on weight.

Synthetic example 1

[0220] In a flask with a cooling tube and a stirrer, put 5 parts of 2,2'-azobis(2,4-dimethylvaleronitrile) and 250 parts of diethylene glycol methyl ethyl ether, and then add 17 parts of methacrylic acid , 45 parts of glycidyl methacrylate, tricyclic methacrylate [5.2.1.0 2，6 ] 23 parts of dec-8-yl esters, 5 parts of styrene, and 10 parts of 2-hydroxyethyl methacrylate, after nitrogen replacement, while stirring slowly, the temperature of the solution was raised to 70°C, and kept at this temperature for 4 Hours of polymerization, to obtain a solid concentration of 28.0% copolymer [α] solution.

[0221] For the obtained copolymer [α], its Mw was measured using GPC (gel permeation chromatography) HLC-8020 (trade name, manufactured by Tosoh Corporation), and the measured value was 18,000.

[0222] Next, 5 parts of 2-methacryloyl hydroxyethyl isocyanate (trade name, Karenz MOI, manufactured by Showa Denko Co., Ltd.), 0.03 parts of di-n-butyltin (IV) dilaurate, 0.1 part of 4-meth...

Synthetic example 2

[0224] In a flask with a cooling tube and a stirrer, put 7 parts of 2,2'-azobis(2,4-dimethylvaleronitrile) and 250 parts of diethylene glycol methyl ethyl ether, and then add 18 parts of methacrylic acid , 30 parts of 2-methyl glycidyl methacrylate, tricyclic methacrylate [5.2.1.0 2，6] 27 parts of dec-8-yl ester, 5 parts of styrene, 10 parts of 2-hydroxyethyl methacrylate, 10 parts of tetrahydrofuran-2-yl methacrylate, after nitrogen replacement, slowly stir while making the solution The temperature was raised to 70°C, and the polymerization was carried out at this temperature for 4 hours to obtain a copolymer [α] solution with a solid content concentration of 29.0%.

[0225] For the obtained copolymer [α], its Mw was measured by GPC (gel permeation chromatography) HLC-8020, and the measured value was 11,000.

[0226] Next, 5 parts of 2-methacryloyl hydroxyethyl isocyanate (trade name Karenz MOI, manufactured by Showa Denko Co., Ltd.), 0.03 parts of di-n-butyltin (IV) dilaura...

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Abstract

To obtain a radiation sensitive resin composition which can acquire a sufficient spacer configuration even in the exposure of not more than 1,200 J / m2with high sensitivity and high resolution and also can form a spacer for a liquid crystal display element excellent in elastic recovery, rubbing resistance, adhesiveness with a transparent substrate, heat resistance, or the like. The radiation sensitive resin composition comprises: a polymer which is obtained by reacting an isocyanate compound expressed by formula (1) (in formula (1), R1represents hydrogen atom or methyl group and R2represents an alkylene group) with a copolymer of (a1) an unsaturated carboxylic acid and / or an unsaturated carboxylic acid anhydride, (a2) an epoxy group-containing unsaturated compound, (a3) a hydroxyl group-containing unsaturated compound, and (a4) another unsaturated compound; a polymerizable unsaturated compound; and a radiation sensitive polymerization initiator.

Description

technical field [0001] In particular, the present invention relates to a novel side-chain unsaturated polymer useful as a resin component of a radiation-sensitive resin composition suitable for forming a spacer in a liquid crystal display element, and a radiation-sensitive resin composition containing the side-chain unsaturated polymer Object, spacer and method for forming same, and liquid crystal display element. Background technique [0002] For a long time, in liquid crystal display elements, in order to keep a certain distance (cell gap) between two substrates, separators such as glass beads and plastic beads with a specified particle size have been used. If there is a spacer in the area where the pixel is formed, there will be a phenomenon that the spacer is reflected, or the incident light will be scattered, and the contrast of the liquid crystal display element will decrease. [0003] In order to solve these problems, a method of forming spacers by photolithography i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08G18/04G03F7/00G02F1/1339
Inventor 一户大吾米仓勇西尾寿浩梶田彻
Owner JSR CORPORATIOON