Method for preparing cuprous chloride using printed circuit board etching waste liquid
A technology of etching waste liquid and cuprous chloride, which is applied in the direction of cupric chloride and copper halide, can solve the problems of energy consumption and material consumption, uneconomical cost, and increased product cost of losing copper sulfate into cuprous chloride, etc. Achieve high utilization rate, reduce production cost, and reduce water consumption
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Embodiment 1
[0016] use Na 2 SO 3 Reduction, active CuO neutralization to prepare CuCl (etching waste liquid composition: CuCl 2 1.790mol / L, HCl 3.114mol / L).
[0017] Measure 220mL of 3mol / L NaOH solution, heat to 90°C, slowly add 93mL of etching waste solution dropwise, heat for 10-15min, wash the precipitate with water by decantation, filter with suction, and dry at 110-120°C for 6 hours to obtain the activity CuO. Heat 50mL of etching waste solution to about 90°C, and alternately add active CuO and Na 2 SO 3 The saturated solution undergoes a reduction reaction, during the reduction process, white precipitates of cuprous chloride are precipitated, and the pH is maintained at 3 to 4, and the solution is colorless and transparent after reduction. Pour this solution into an equal volume of water to dilute, filter with suction, wash the precipitate with 2% hydrochloric acid, wash with absolute ethanol, dry at 110°C for 1 hour, and seal the package. A total of 11.62 g of deactivated co...
Embodiment 2
[0019] use SO 2 Reduction, neutralization of basic copper carbonate to prepare CuCl (etching waste liquid composition: CuCl 2 1.790mol / L, HCl 3.114mol / L).
[0020] The etching waste liquid is neutralized to pH=2 with NaOH, and diluted with water to C(Cu 2+ )=0.5mol / L, get 100mL of this etching waste liquid and 100mL concentration be the Na of 0.5mol / L 2 CO 3 The solutions were heated to 75°C, and the etching waste solution was added to Na 2 CO 3 Put it in the solution, let it stand still, wash the precipitate by decantation, filter it with suction, and dry it at 80-100°C to obtain basic copper carbonate. Dilute 50mL of the etching waste solution with water, heat to about 90°C, alternately add basic copper carbonate and SO 2 During the reduction process, cuprous chloride white precipitates out, keeping pH=3~4, and the solution becomes colorless and transparent after reduction. Pour this solution into an equal volume of water to dilute, filter with suction, wash the preci...
Embodiment 3
[0022] Reduction of waste miscellaneous copper, neutralization of active CuO to prepare CuCl (etching waste liquid composition: CuCl 2 1.790mol / L, HCl 3.114mol / L).
[0023] Dilute the etching waste solution to a copper content of 20g / L, take 100ml, heat it to about 90°C, reduce it with waste copper, keep the excess copper, add NaCl to promote the dissolution of waste copper, and make the solution colorless and transparent. Filtrate, keep the filtrate above temperature, add active CuO and Na alternately 2 SO 3 Carry out reduction, keep the final pH = 3 ~ 4 to obtain a colorless transparent solution, pour this solution into an equal volume of water to dilute, filter with suction, wash the precipitate with 2% hydrochloric acid, wash with absolute ethanol, and dry at 110°C for 1 hour. sealed package. A total of 4.65 g of active copper oxide was added, and the obtained cuprous chloride crystal was 11.19 g, and the yield was 93.0%.
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