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Variable multi-power projection optical system

A technology of projection optical system and optical system, which is applied in the field of devices, can solve problems such as not being a solution, not mentioning machinability, optical processing, and optical detection difficulties, achieving large-scale freedom, reducing volume, and ensuring imaging quality effect

Inactive Publication Date: 2007-07-18
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] As shown in Figure 1, in the U.S. patent that the patent No. is US 6,879,383, disclose a kind of by 2 reflecting prisms S1A, S1B, 3 single lenses L1-L3 (from left to right are plano-convex lens, meniscus negative lens, meniscus thick lens, all convex faces toward the concave spherical reflector), the projection system that 1 concave spherical reflector M forms, yet the working distance that the 5 best embodiments listed in this technical scheme can only reach 7.5mm to 11mm, the working distance puts a very strict size limit on the design of the actual workpiece table, especially the design of the mask table; Increase the working distance to 11mm, and the total length of compressed optics to 1150mm, and the introduction of the aspheric surface will also bring great difficulties to optical processing, optical inspection, etc.; in addition, the patent does not provide imaging quality, and does not mention machinability sex
[0005] Figure 2 shows another projection system, which corresponds to the Chinese patent application No. 200610028605.7. Although this projection system has improved the technical solution of the above-mentioned US patent, its working distance is only 23mm, and it does not have the ability to adjust the magnification. So it's not an ideal solution either

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  • Variable multi-power projection optical system
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Embodiment Construction

[0032] The variable magnification projection optical system of the present invention will be described in more detail below in conjunction with the accompanying drawings and specific embodiments.

[0033] As shown in Figure 3, the variable magnification projection optical system of the present invention is made up of three major parts, and the first part comprises object space reflective prism L11, image square reflective prism L12, plano-convex lens L2 and meniscus thick lens L3; The second part comprises Concave-convex lens L4, double-convex lens L5 and double-concave lens L6; the third part includes variable power component L7 and concave spherical mirror L8. Wherein, the convex surfaces of the plano-convex lens L2 of the first part and the thick meniscus lens L3 are all facing the concave spherical reflector L8, and the incident surface of the object-side reflective prism L11 of the first part is a plane, which faces the object plane (mask table) of the projection optical s...

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Abstract

A projection optical system with variable multiplying power is prepared as setting reflection prism set, positive lens set, telescopic lens set and concave-spherical reflector along light axle direction; arranging 200m set with its convex surface faced to concave-spherical reflector between telescopic lens set and said reflector, using a 200m control driving unit to drive said 200m set to move along light axle for realizing regulation of multiplying power.

Description

technical field [0001] The invention relates to devices such as semiconductor photolithography and photo-plate making, in particular to a projection optical system. Background technique [0002] Projection lithography has been successfully used in the fabrication of integrated circuits with submicron resolution. In semiconductor packaging technology, projection lithography is used for gold bumps / tin bumps (bumping), silicon wafer level chip scale packaging ( WLCSP) technology and other fields, and for the low-resolution projection objective lens system, the demand for improvement and performance improvement is continuously raised. [0003] Since the mask table and the workpiece table need to perform stepping motion and scanning motion, the projection objective lens system with a large working distance will bring great convenience to the motion positioning and transmission structure design of the mask and silicon wafer. And because the current packaging process, such as the...

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Application Information

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IPC IPC(8): G02B27/18G02B15/14G02B1/00G03F7/20
Inventor 蔡燕民刘国淦
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD