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Low reflective film and manufacturing method thereof

A low-reflection film and manufacturing method technology, applied in optics, instruments, nanotechnology, etc., can solve the problems of easy scratches on display devices, high coating costs, and low surface hardness, and achieve excellent surface hardness and easy reflectivity , easily controlled effects

Inactive Publication Date: 2010-12-22
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0007] However, in the above-mentioned prior art, when inorganic particles are used, the coating cost is too high, and when fluorine-based compounds are used, the surface hardness is low, and it is easy to scratch, so it is easy to scratch when used in display devices. At present, it is necessary to overcome this problem. class questions

Method used

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  • Low reflective film and manufacturing method thereof
  • Low reflective film and manufacturing method thereof
  • Low reflective film and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0047] A hard coating (product name: DN-0080, manufacturer: DSM) was coated on a triacetyl cellulose film (hereinafter referred to as TAC film), thermally dried at 70°C for 1 minute, and then irradiated with a high-pressure mercury lamp at 700mJ / cm 2 UV light and it cures. As the coating material for the porous layer, 20% by weight of polyacrylic acid was mixed with a hard coating material (product name: DN-0080, manufacturer: DSM). The mixed paint for porous layer was applied on the TAC film formed with the hard coat layer at a thickness of 110 nm, thermally dried at 70° C. for 1 minute, and then irradiated with a high-pressure mercury lamp at 700 mJ / cm 2 UV light cures it. The produced film was left to stand for 10 minutes in water as a solvent at a temperature of 50° C. to remove polyacrylic acid, and then dried at 80° C. for 5 minutes to form a porous layer, thereby producing a low-reflection film. The void size formed was about 50 nm.

Embodiment 2

[0049] The conditions were the same as those of Example 1 above, except that the polyacrylic acid content of the coating material for porous layers when mixed with the hard coating material (product name: DN-0080, manufacturer: DSM) was changed to 25% by weight.

Embodiment 3

[0051] The conditions were the same as those of Example 1 above, except that the polyacrylic acid content of the coating material for porous layers when mixed with the hard coating material (product name: DN-0080, manufacturer: DSM) was changed to 30% by weight.

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Abstract

The invention relates to a low reflection film and its manufacturing method. Through forming coating for porous layer containing soluble matter, the soluble matter is solved and extracted by solvent to form gap to manufacture the porous layer. The refractive index can be adjusted by porosity, therefore the surface reflection is below 2%, with excellentanti-scuffing ability and low cost.

Description

technical field [0001] The present invention relates to a low-reflection film and a method for manufacturing the same, and in particular to a method for dissolving and extracting the soluble substance by using a solvent after forming a coating for a porous layer including a soluble substance, thereby providing voids on the above-mentioned coating for a porous layer , a low-reflection film forming a porous layer and a manufacturing method thereof. Background technique [0002] At present, with the rapid development of display technology, on display devices such as LCD, CRT, PDP or OLED (Organic Liquid Crystal Display), usually in order to prevent the contrast (Contrast) from being reduced due to the reflection of external light and the reflection of images, the outermost part of the display device is An antireflection film is arranged on the surface of the layer. Anti-reflection films with this function are coated with anti-reflection (AR, Anti-Reflection) or low-reflection ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B1/11B32B5/18B32B7/02B82Y20/00B82Y30/00B82Y40/00C08J9/26G02B1/10G02B1/111G02B1/14G09F9/00
CPCB32B5/18B32B27/065B32B2307/416B32B2307/418G02B1/10
Inventor 梁敏洙琴同基李佳妍林巨山
Owner DONGWOO FINE CHEM CO LTD