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Observation apparatus with focal position control mechanism

A technology of control mechanism and observation device, applied in installation, instrument, microscope and other directions, can solve the problems of focus position shift, difficulty in correctly grasping defects, etc., and achieve the effect of improving focus stability, improving defect classification accuracy, and easy comparison.

Inactive Publication Date: 2007-08-15
OLYMPUS CORP
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  • Abstract
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  • Application Information

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Problems solved by technology

[0012] However, in the above-mentioned conventional observation apparatus with a focus position control mechanism, since calculation processing is performed on all light spot projection signals reflected from the subject, there is a problem of a desired focus range such as being out of the imaging range. Influenced by the height difference or reflectivity of the outer pattern, but the focus position in the range that really wants to focus is shifted
Therefore, in the case of a device that performs defect inspection, it is difficult to accurately grasp the defect

Method used

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  • Observation apparatus with focal position control mechanism
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  • Observation apparatus with focal position control mechanism

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Embodiment Construction

[0062] A first embodiment of the present invention will be described with reference to FIGS. 1 to 4 .

[0063] As shown in FIG. 1 , an AF device for a microscope (observation device with a focus position control mechanism) 1 according to this embodiment has an observation optical system 6 that transmits illumination light through one of a plurality of interchangeable objective lenses 2 . irradiated onto the subject 3, and has a CCD (imaging device) 5 for observing reflected light from the subject 3; a focus detection optical system 10 for detecting the relative distance between the objective lens 2 and the subject 3, It also has a light projecting part 7 and a photodetector (photoelectric conversion part) 8. The light projecting part 7 irradiates laser light (invisible light) with an infrared wavelength to the subject 3 through the objective lens 2 of the observation optical system 6. The photodetector The device 8 is arranged on the image plane of the optical image of the las...

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Abstract

The invention provides an observation apparatus with focal position control mechanism. An AF device for a microscope has an observation optical system (6) having a CCD (imaging element)(5) for emitting, through one of interchangeable objective lenses (2), illumination light to an object (3) to be observed and observing reflection light from the object (3); a projection section (7) for emitting a laser beam (invisible light) to the object (3) through the objective lens (2) of the observation optical system (6); a focus point detection optical system (10) having a photodetector (photoelectric conversion section) (8) that is disposed on an image plane of an optical image of laser beam reflected by the object (3) and outputs a signal depending on the position, in the image plane, of the optical image and detecting a relative distance between the objective lens (2) and the object (3); an object position adjustment means (11) for adjusting a focus position of the object (3) based on the output signal from the focus detection optical system (10); and a restriction means (12) for regulating the area of projection of the laser beam into the imaging area of the CCD (5).

Description

technical field [0001] The invention relates to an observation device with a focus position control mechanism. [0002] This application claims priority based on Japanese Patent Application No. 2004-269669 filed in Japan on September 16, 2004, the content of which is incorporated herein by reference. Background technique [0003] Until now, observation devices such as microscopes capable of observing fine test materials as objects or recording observed images as video images have been widely used in inspection processes ranging from research in the biological field to industrial fields. In the case of using such a microscope, focus adjustment for observing a test material is usually performed by operating a focus handle to perform focusing work. However, in a case where the depth of focus is shallow and the focus range is narrow, as with a high-magnification objective lens, considerable skill is required to quickly perform focusing operations. [0004] When the operability...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B7/28G02B21/00
CPCG02B21/247
Inventor 仓田俊辅辻治之
Owner OLYMPUS CORP