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Manufacturing method of colourful optical filter

A color filter and manufacturing method technology, applied in optics, optical components, instruments, etc., can solve the problems of excessive time-consuming etching process, low etching rate, affecting production capacity, etc. The effect of dense structure

Active Publication Date: 2010-05-19
UNITED MICROELECTRONICS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the composite layer formed under high temperature environment has a dense structure and is difficult to etch, and the thickness of the composite layer is as high as (800nm), its etching rate is too low, often makes the etching process take too much time, seriously affecting the production capacity

Method used

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  • Manufacturing method of colourful optical filter
  • Manufacturing method of colourful optical filter
  • Manufacturing method of colourful optical filter

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Experimental program
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Embodiment Construction

[0030] Please refer to figure 1 , the manufacturing method of the color filter of the present invention is to first form a composite layer with a relatively loose structure at a relatively low temperature, step 102 . Then, in step 106 , a processing step, such as an annealing process, is performed at a higher temperature to make the structure of the composite layer denser and form the required color filter. A composite layer with a relatively loose structure is, for example, a stacked layer formed by interleaving titanium oxide layers and silicon oxide layers, a stacked layer formed by interlaced stacking layers of tantalum pentoxide and silicon oxide layers, or a layer of zinc sulfide and magnesium fluoride. Stacked layers stacked staggered. The forming temperature is, for example, higher than 0°C and lower than 150°C. Preferably the annealing process is between 0°C and 100°C. The annealing process can reduce dangling bonds in the structure and make the structure more comp...

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Abstract

The present invention provides the manufacturing method of a color filter. The method is as follows: a composite layer with the incompact structure is formed firstly; then the composite layer with theincompact structure is patterned; finally, a further treatment step is conducted, so the structure of the pattern composite layer with the incompact structure is compacted and the color filter is formed.

Description

technical field [0001] The invention relates to a semiconductor process method, in particular to a method for manufacturing a color filter. Background technique [0002] The multimedia technology in today's society is quite developed, most of which benefit from the progress of semiconductor elements or display devices. As far as displays are concerned, liquid crystal displays with superior characteristics such as high image quality, good space utilization efficiency, low power consumption, and no radiation have gradually become the mainstream of the market. [0003] The liquid crystal display is mainly composed of a display panel and a backlight module, wherein the display panel includes an active matrix display substrate and a color filter. The color filter is used to filter the light emitted by the backlight module, so that the liquid crystal display has a full-color function. [0004] Color filters can generally be divided into filters with a single film layer and filte...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/23
Inventor 吴沂庭
Owner UNITED MICROELECTRONICS CORP