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Illumination optical system, exposure apparatus, and exposure method

A lighting device and optical technology, which is applied in the field of optical lighting device, exposure device and exposure, and can solve problems such as unrealized lighting conditions

Inactive Publication Date: 2008-06-18
NIKON CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, the lighting conditions necessary to faithfully transfer the mask pattern cannot be achieved

Method used

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  • Illumination optical system, exposure apparatus, and exposure method
  • Illumination optical system, exposure apparatus, and exposure method
  • Illumination optical system, exposure apparatus, and exposure method

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Embodiment Construction

[0108] In order to further explain the technical means and effects of the present invention to achieve the intended purpose of the invention, the specific implementation and structure of the optical lighting device, exposure device and exposure method proposed in accordance with the present invention will be given below in conjunction with the accompanying drawings and preferred embodiments. , Methods, steps, characteristics and effects are described in detail below.

[0109]FIG. 1 is a schematic diagram showing the structure of an exposure device equipped with an optical illuminating device according to an embodiment of the present invention. As shown in Figure 1, the normal direction of the wafer W along the photosensitive substrate is set as the Z axis, and the direction parallel to the surface of the wafer W on the surface of the wafer W is set as the Y axis. The direction perpendicular to the surface of Fig. 1 on the surface is set as the X axis. In addition, in FIG. 1, the o...

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Abstract

An illumination optical system for, when installed in an exposure system, realizing an adequate illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of light. The illumination optical system has a light source unit (1) for supplying a linearly polarized light for illuminating surfaces (M, W) to be illuminated therewith and polarized state changing means (10, 20) for changing the polarized state of the illuminating light from a specific polarized state to a nonpolarized state and vice versa. The polarized state changing means are arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing means can be removed from the illumination optical path and has a depolarizer (20) for depolarizing the incident linearly polarized light as necessary.

Description

[0001] This application is a divisional application of the patent application entitled "Optical Illumination Apparatus, Exposure Apparatus and Exposure Method" with the application number: 2003800044450.5, application date: December 2, 2003. Technical field [0002] The present invention relates to an optical illuminating device, an exposure device and an exposure method, in particular to an exposure device for manufacturing micro devices such as semiconductor components, photographing components, liquid crystal display components, thin-film magnetic heads, etc. by a photolithography process. Background technique [0003] In such a typical exposure device, the light beam emitted from the light source passes through the fly-eye lens as an optical integrator to form a secondary light source composed of multiple light sources as a substantial surface light source. The light beam from the secondary light source is restricted by an aperture arranged near the focal plane of the fly eye ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G02B27/28
Inventor 谷津修田中裕久村松研一小峯典男西永寿松山知行工藤威人
Owner NIKON CORP