Microoptic glucose detector
A detector and light source technology, applied in the field of fully integrated fluorescence detection microsystems, can solve problems such as unused fluorescence detection units or fluorescence detection microsystems
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Embodiment 1
[0065] according to figure 1 with figure 2 The synthetic route shown in to prepare the fluorescent compound of formula II (where n and m are each 1, p is 2): first, the phenylboronic acid anhydride of formula 1 is prepared as follows: o-bromotoluene and magnesium (1.1 equivalent) in React in diethyl ether at 25°C. To a solution of trimethylboronate (10 equivalents) in diethyl ether was added dropwise a Grignard reagent at -78°C. The mixture was stirred for an additional 2 hours, then allowed to warm to room temperature and stirred for an additional 2 hours. Diethyl ether was removed under reduced pressure and the solid was recrystallized from water. The product phenylboronic acid was dried overnight in a vacuum oven to produce phenylboronic anhydride.
[0066] Phenylboronic anhydride was mixed with NBS (N-bromosuccinimide) (1.1 equivalents) and catalytic AIBN (azoisobutyronitrile) in carbon tetrachloride as solvent. The mixture was refluxed for 2 hours under the irradiat...
Embodiment 2
[0071] Self-assembled monolayers of the compound of formula II were prepared by immersing micropatterned gold platelets in a solution of the compound of formula II for 15 hours. The solution concentration was 1.0 mM, and the solvent was 9:1 THF:methanol. Fixation methods were monitored by SPR spectroscopy. After the SAM was formed, the pellet was rinsed with methanol and then dried under nitrogen.
[0072] Microscope glass coverslips were used as the substrate for the gold flakes. coverslips with Piranha solution (30% H 2 o 2 : Concentrated H 2 SO 4 1:3) for 15 seconds, with Milli- Rinse carefully with grade water. The coverslip was then dried under a stream of nitrogen and placed in a vacuum evaporator. A gold film (about 500 nm thick) was deposited on the coverslip using a Polaron E5000 sputtering system. Hold the sputtering system for 180 seconds under the following conditions: 2.0 x 10 -2 mbar and 20mA.
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