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Method for preparing norbornene and acrylic ester copolymer

A norbornene and acrylate technology, which is applied in the field of preparation of norbornene and acrylate copolymers, can solve the problems of less research on norbornene and maleic anhydride copolymerization, small molecular weight of copolymers, and low degree of alternation of copolymers and other problems, to achieve the effect of good catalytic effect, short reaction time, easy washing and separation

Inactive Publication Date: 2010-06-16
NINGBO UNIVERSITY OF TECHNOLOGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, the methods for synthesizing these materials mainly include free radical polymerization and other methods. These synthetic methods currently used have disadvantages such as long reaction time, low yield of copolymer, small molecular weight of copolymer, low degree of copolymer alternation, etc. Research on the copolymerization of ene and maleic anhydride has been seldom carried out
[0004] U.S. Patent No. 6,593,440 proposes to adopt palladium catalyst to prepare norbornene and acrylate copolymer, which can improve the molecular weight of copolymer, but the reaction time of adopting palladium series catalyst to catalyze norbornene and acrylate copolymerization is long, the copolymer yield is low, Copolymer alternation is low

Method used

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Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0028] 1. Preparation of iron complex catalyst.

[0029] The general preparation process of the iron complex catalyst is as follows; put the ferric chloride and the ligand into a single-mouth glass bottle that has been evacuated several times and baked with nitrogen, the bottle mouth is sealed with a latex tube, and a certain amount of Dissolve the second solvent, inject a certain amount of halogenated hydrocarbon with a syringe, put the glass bottle into a constant temperature water bath, keep the temperature at 20-100°C for 15-60 minutes, and obtain the iron complex catalyst after cooling.

Embodiment 1

[0031] Take 0.01 mole of ferric chloride, 0.01 mole of 8-hydroxyquinoline and 0.01 mole of 1-bromo-1-phenylethane and dissolve them in 20 ml of cyclohexanone, put them in a vacuum-pumped and nitrogen-filled oven In a single-necked glass bottle, seal the bottle mouth with a latex tube, keep the temperature in a water bath at 70°C for 40 minutes, and obtain the iron complex catalyst A after cooling.

Embodiment 2

[0033] Take 0.01 mole of ferric chloride, 0.03 mole of α,α,-bipyridine and 0.01 mole of 1-bromo-1-phenylethane and dissolve it in 20 ml of anisole, put it in a vacuum-pumped and nitrogen-filled mixture for several times. In a baked single-necked glass bottle, seal the bottle mouth with a latex tube, keep the temperature in a water bath at 70°C for 40 minutes, and obtain the iron complex catalyst B after cooling.

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PUM

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Abstract

The invention relates to a method for preparing a copolymer of norbornene and acrylic ester. The method adopts an iron complex as a catalyst to catalyze alternated copolymerization of the norbornene and the acrylic ester; the reaction time is short with only 6 to 8 hours; and the yield of the copolymer is high and can reach between 40 and 80 percent.

Description

technical field [0001] The invention relates to the field of polymer polymerization, in particular to a preparation method of a norbornene-acrylate copolymer. Background technique [0002] Polynorbornene is a special polymer with excellent mechanical properties, heat resistance, solubility in organic solvents and transparency, and can be used for 157nm ultraviolet lithography. The main disadvantages of this material are brittleness, poor viscosity and low molecular weight. After the acrylate is inserted into the main chain of polynorbornene, the cohesiveness and solubility of the polymer can be improved, and this copolymer can be used as a photoresist material for 157nm lithographic printing technology. Moreover, the development of the microelectronics industry requires components with smaller sizes. For the exposure technology suitable for line widths of 1.3 μm and below, 157nm F2 photolithography technology can be selected. These technologies involve all aspects of the ph...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08F232/08C08F220/10C08F4/80
Inventor 房江华胡敏杰杨建平高浩其
Owner NINGBO UNIVERSITY OF TECHNOLOGY