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Photolithography system

一种光刻系统、曝光区域的技术，应用在曝光处理的控制领域，能够解决受限、相对运动和曝光间距时间长等问题

Inactive Publication Date: 2009-02-11
ORC MFG
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, the relative movement of the stage and the exposure pitch are limited due to the long time required to process the data

Method used

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  • Photolithography system
  • Photolithography system
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Examples

Experimental program
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Embodiment Construction

[0026] Preferred embodiments of the present invention are described below with reference to the accompanying drawings.

[0027] figure 1 is a schematic perspective view of the photolithography system according to this embodiment. Fig. 2 is a schematic sectional view of an exposure unit. image 3 is a diagram showing scanning processing.

[0028] A photolithography system 10 having a gate 12 and a base 14 is an apparatus for projecting light on a substrate SW coated with a photosensitive material to image or form a circuit pattern on the substrate SW. An X-Y guide mechanism (not shown here) supporting the table 18 is provided on the base 14 , and the substrate SW is set on the table 18 .

[0029] Eight exposure units 20 are attached on the door piece 12 1 to 20 8 . an exposure unit 20 1 Equipped with a first illumination optical system (not shown), a second illumination optical system 22, a DMD 24 and an objective optical system 26 (see FIG. 2). Other exposure units 20 ...

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PUM

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Abstract

A photolithography system has at least one spatial light modulator, a scanning mechanism configured to move an exposure area relative to a target object in a scanning direction, a plurality of memories (1st to Nth memories), a data processor, and exposure controller. The exposure area is defined as a projection area of the spatial light modulator. The plurality of memories corresponds to a plurality of partial exposure areas that is defined by dividing the exposure area. The data processor successively writes exposure data into each memory in accordance with the timing of an exposure, and the exposure controller controls the plurality of light modulating elements on the basis of the relative position of the exposure area. The data processor writes newly generated exposure data into the first memory, and shifts exposure data stored in the 1st to (N-1)st memories to the 2nd to Nth memories, respectively.

Description

technical field [0001] The present invention relates to a maskless or reticleless lithography system for writing or forming patterns directly on a target object such as a substrate. In particular, the invention relates to the control of the exposure process. Background technique [0002] The present invention relates to subject matter contained in Japanese Patent Application No. 2007-209528 (filed Aug. 10, 2007), the entire contents of which are expressly incorporated by reference. [0003] When manufacturing integrated circuits, a printed circuit board or a substrate coated with a photoresist is subjected to photolithography processing, ie, exposure processing, for imaging a predetermined pattern on the substrate. In maskless or reticleless lithography systems, spatial light modulators with multiple two-dimensional array elements are used, such as DMDs (Digital Micromirror Devices) or LCDs (Liquid Crystal Devices). Light from the light source is reflected by modulating el...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20H01L21/00H01L21/027
CPCG03F7/704G03F7/70275G03F7/70291G03F7/70508G02B26/0833G02F2203/12
Inventor 奥山隆志小林义则
Owner ORC MFG