Apparatus for producing trichlorosilane and method for producing thrichlorosilane
A technique for manufacturing devices for trichlorosilane, which is applied in the direction of halosilane and silicon halide compounds, can solve the problems of poor reaction efficiency and small contact area, and achieve the goal of improving reaction efficiency, increasing contact area, and improving reaction efficiency Effect
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[0028] Hereinafter, an embodiment of the present invention will be described with reference to the drawings.
[0029] This trichlorosilane manufacturing apparatus 1 includes: a reaction furnace 2, a raw material supply mechanism 3 for supplying metal silicon powder as a raw material to the reaction furnace 2, a gas introduction mechanism 4 for introducing hydrogen chloride gas reacting with the metal silicon powder, and A gas extraction mechanism 5 that discharges the generated trichlorosilane gas.
[0030] The reaction furnace 2 includes a vertically vertical chamber 6 formed mostly in a straight cylindrical shape, a bottom 7 connected to the lower end of the chamber 6 , and a large-diameter portion 8 connected to the upper end of the chamber 6 . At this time, the bore portion 6 and the bottom portion 7 are formed to have approximately the same diameter, and are separated by a horizontal partition wall 9 therebetween. On the other hand, on the top of the bore portion 6, a ta...
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