Method for polishing element surface using nano colloid jet flow

Abstract

The invention relates to a method for polishing the surface of an element by utilizing nanometer colloid jet flow, which relates to a method for polishing an element through by colloid jet flow. The method solves the problem that the prior polishing method is difficult to make the surface of the element reach the requirement of an ultra-smooth surface or the requirement of the ultra-smooth surface is reached but the manufacturing cost is over high. The method comprises the following steps: jetting a nanometer colloid on the surface of the element under the condition that the jet flow pressureis between 0.1 and 10 MPa, and the jetting speed is between 10 and 200 m / s, wherein the dynamic viscosity of the nanometer colloid is between 0.001 and 0.02 N.s / m<2>, and the pH value is between 8 and 12. The method is applicable to the ultraprecise and ultra-smooth polishing for brittle materials such as optical glass, microcrystalline glass, semiconductor materials, single crystal materials andthe like, the surface roughness of the element after the polishing is less than 1 nm (Rms) so that the requirement on an ultra-smooth surface is achieved.

Description

Method for Polishing Component Surface Using Nano Colloid Jet technical field The invention relates to a method of applying a colloid jet polishing element. Background technique With the development of modern short-wave optics, strong light optics, electronics and thin film science, the requirements for ultra-smooth surfaces are put forward for components, and the surface roughness is required to be less than 1nmRms. It has low surface waviness and high surface shape accuracy; surface defects and subsurface damage are minimized, and the residual processing stress on the surface is extremely small; the crystal surface has a complete lattice structure and no lattice dislocations on the surface. The ultra-smooth surface processing technology of aspheric devices (especially aspheric and free-form devices with small curvature radius) is a huge problem in optical processing. Relying on the traditional experience-dependent optical processing methods can no longer meet the growi...

AI Technical Summary

Problems solved by technology

The purpose of the present invention is to solve the problem that the existing polishing method is difficult to make the component surface meet the requirement of ultra-smooth surface or can meet the requirement of super-smooth surface but the processing cost is too high. method

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