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Quartz transmission polarization irrelevant beam-splitting grating for 1310 nanometer waveband

A beam splitting grating, dual-channel technology, applied in the direction of diffraction grating

Inactive Publication Date: 2009-11-04
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

But as far as we know, so far, no one has given the design parameters of high-density deep-etched fused silica high-efficiency transmission dual-channel polarization-independent beam-splitting grating for the 1310 nm wavelength band commonly used in optical communications

Method used

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  • Quartz transmission polarization irrelevant beam-splitting grating for 1310 nanometer waveband
  • Quartz transmission polarization irrelevant beam-splitting grating for 1310 nanometer waveband
  • Quartz transmission polarization irrelevant beam-splitting grating for 1310 nanometer waveband

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Embodiment Construction

[0016] Using micro-optical technology to manufacture high-density deep-etched rectangular dual-channel beam-splitting gratings, first deposit a layer of metal chromium film on a dry and clean fused silica substrate, and evenly coat a layer of positive photoresist on the chromium film (Shipley, S1818, USA). The grating is then recorded holographically (see Figure 4 ), using a He-Cd laser 7 (with a wavelength of 441.6 nm) as the recording light source. When recording the holographic grating, the shutter 8 is opened, and the narrow beam emitted from the laser is divided into two narrow beams by the beam splitter 9. After one beam passes through the mirror 10, it passes through the beam expander 14 and the lens 16 to form a wide plane wave; after the other beam passes through the mirror 11, it passes through the beam expander 15 and the lens 17 to form a wide plane wave. After the two beams of plane waves pass through the mirrors 12 and 13 respectively, they form an interferenc...

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Abstract

The invention relates to a quartz transmission polarization irrelevant beam-splitting grating for 1310 nanometer waveband. The duty ratio of the grating is 0.5, the cycle is between 888 and 894 nanometers, and the etching depth is between 2.858 and 2.890 micrometers. The TE polarized light and the TM polarized light of the beam-splitting grating can simultaneously meet that the difference between the ratio of -1 level diffraction efficiency to 0 level diffraction efficiency of the TE polarized light or the TM polarized light (the ratio of the -1 level diffraction efficiency to the 0 level diffraction efficiency is 1) and the ideal isocandela beam splitting condition is less than 5 percent.

Description

technical field [0001] This patent relates to a dual-channel polarization-independent beam splitting device, especially a quartz transmission dual-channel polarization-independent beam-splitting grating for 1310 nanometer band. Background technique [0002] Beam splitters are widely used in various optical systems. It can divide a beam of incident light into several beams of outgoing light with equal energy. Among them, a double-channel beam splitter (1×2 beam splitter) is the most commonly used beam splitter. device. Traditional beam splitters based on multi-layer dielectric films have large energy losses, complex manufacturing processes, and high costs. Photonic crystals, which have emerged in recent years as beam splitters, also have disadvantages such as high cost and difficult manufacture. Some literatures have reported high-density phase gratings as 1×2 beam splitters, which are basically designed for a specific polarization state [Prior Art 1: B.Wang et al., Appl.Op...

Claims

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Application Information

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IPC IPC(8): G02B5/18
Inventor 周常河冯吉军
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI