All-optical diode super-transmission device and manufacturing method thereof
An all-optical diode and device technology, applied in the field of communications, can solve the problems of complex and difficult to control the preparation process of periodically polarized lithium niobate crystals and two-dimensional photonic crystals
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[0074] Embodiment 1 super-transmissive device
[0075] On a quartz substrate with a thickness of 17 μm and a length and width of 2 cm, a 200 nm-thick MEH-PPV film (as dielectric layer II) was prepared by using the commonly used chemical spin-coating technique; then, using the commonly used magnetron sputtering coating technology ( or electron beam evaporation technology, etc.) on the MEH-PPV film, a gold film (as a metal layer) with a thickness of 200nm is plated; the focused ion beam etching technology (or other photolithography technology) commonly used in the microelectronics industry is used to deposit gold on the gold film. Periodic slits are etched on the film, the slit period is 800nm, and the slit width is 50nm; finally, a 300nm thick MEH-PPV film (as the dielectric layer I) is prepared on the gold film by using the spin coating technique commonly used in chemistry. . Due to the surface tension of the liquid, MEH-PPV will not enter the slit during the spin-coating pro...
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