Method for detecting etching fluid filter
A filter and etching solution technology, which is applied in the field of semiconductor technology, can solve the problems of undetectable filter aging, etc., and achieve the effects of reducing the generation of defective products, ensuring the pass rate, and improving the accuracy of measurement
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[0017] The method for monitoring the filter used in the etching solution of the present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments.
[0018] Since the existing detection method cannot detect whether the filter is aging, the present invention proposes a new detection method for detecting the problem of filter aging, please refer to image 3 , image 3 This is a schematic flow chart of the method for monitoring a filter used in an etching solution of the present invention, including step 111: selecting multiple points on a wafer covered with a uniform oxide film. The oxide should not be too thick, generally below 100 nanometers This is for the consideration of the over-etching monitoring process later. If the thickness is too thick, the over-etching monitoring process will take a long time and affect normal production. In addition, the selected points on the wafer are more than 40. At least 40, and evenly ...
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