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Evaporation source and film-forming device

A film-forming device and film-forming material technology, applied in ion implantation plating, metal material coating process, coating, etc., can solve problems such as excessive time, adverse effects of film-forming device maintainability, etc.

Inactive Publication Date: 2010-12-29
ULVAC INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0008] However, when multiple gasification sources are used, with the increase of the number of gasification sources, it takes more time to disassemble and assemble the gasification source each time the film-forming material is replenished, which makes the maintainability of the film-forming device unfavorable influences

Method used

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  • Evaporation source and film-forming device
  • Evaporation source and film-forming device
  • Evaporation source and film-forming device

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Embodiment Construction

[0018] Hereinafter, a film forming apparatus 10 according to an embodiment of the present invention will be described with reference to the drawings. figure 1 is a schematic plan view of the film forming device 10 . exist figure 1 Among them, the film forming apparatus 10 includes a polygonal cylindrical vacuum chamber 11 extending in a direction perpendicular to the paper surface (hereinafter simply referred to as the rotation axis direction).

[0019] The vacuum tank 11 includes a cylindrical drum 12 extending in the direction of the rotation axis. The rotating drum 12 is an embodiment of a rotating mechanism. The drum 12 is centered on its central axis (hereinafter referred to as the rotation axis C) at a preset speed such as 100rpm counterclockwise ( figure 1 Rotate in the direction of the arrow shown in). The drum 12 serves as a holder and detachably holds the substrate S to be film-formed along its outer circumference. While the drum 12 rotates the substrate S in it...

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Abstract

Provided is an evaporation source (20) which improves the utilization efficiency of a film-forming material (29) without diminishing maintainability. The evaporation source (20) comprises: one tube-shaped peripheral wall (25) having a plurality of containment spaces (25S); and a plurality of dividing walls (27) that partition the area inside the peripheral wall (25) into the plurality of containment spaces. A plurality of holes (28) are formed in the peripheral wall (25) such that each containment space (25S) has at least one hole. The holes (28) connect the containment spaces (25S) with the outside so as to evaporate the film-forming material (29) stored in each containment space toward the outside.

Description

technical field [0001] The invention relates to a gasification source and a film forming device. Background technique [0002] An optical film as an optical product includes a plurality of layers having different refractive indices. By laminating each layer on a substrate, various optical characteristics such as antireflection, filterability, and reflectivity can be obtained. For example, oxides of metals such as tantalum, titanium, niobium, and zirconium are used as high-refractive-index materials, and silicon dioxide and magnesium fluoride are used as low-refractive-index materials. [0003] The manufacturing process of an optical thin film involves using a so-called sputtering method in which a plurality of targets are formed using a dielectric containing a low-refractive-index material, a high-refractive-index material, or other materials, and sputtering emitted from each target The particles are deposited sequentially on the substrate. Such sputtering methods include...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24C23C14/08C23C14/12C23C14/58
CPCC23C14/243
Inventor 山本治彦国分健二郎
Owner ULVAC INC