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Layout chart correction method

A pattern and layout technology, applied in the field of non-blind spot correction layout patterns, can solve the problems of influence and inability to output layout patterns accurately

Active Publication Date: 2013-11-06
UNITED MICROELECTRONICS CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantage of this detection based on 45-degree angles is that there will be blind spots between each 45-degree angle, and these blind spots will affect the entire correction process and cannot accurately output the desired layout pattern

Method used

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  • Layout chart correction method
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Embodiment Construction

[0032] Please refer to figure 1 , figure 1 It is a flow chart of the method for modifying the layout pattern of the present invention. The method for modifying a layout pattern according to the present invention includes the following steps. First, go to step 10, input an original layout pattern into a computer system, wherein the layout pattern includes at least one segment, and the original layout pattern has been performed at least once by the computer system or other computer systems Optical Proximity Correction (OPC ) corrected pattern. Wherein, the optical proximity correction is a correction method generally used in the industry to correct the line width, the end of the line, and the corner of each line segment in the layout pattern. Next, proceed to step 12, inputting a process rule into the computer system, wherein the process rule includes making the layout pattern conform to the rules of the critical line width and critical spacing of the circuit design or other ...

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Abstract

The invention discloses a layout chart correction method, which comprises the following steps of: first inputting a layout chart which comprises at least one line segment; then forming a regular detection rectangle comprising at least a square by using the line segment; next detecting whether the square is superposed with the other parts of the layout chart or not; later on removing the areas, superposed with the other parts of the layout chart, of the square to obtain a corrected layout pattern; and finally outputting the corrected layout chart to a photomask.

Description

technical field [0001] The invention relates to a method for correcting layout patterns, in particular to a method for correcting layout patterns without blind spots. Background technique [0002] In the manufacturing process of semiconductor devices, key technologies such as photolithography and etching are often used. Lithography involves transferring a complex integrated circuit pattern onto the surface of a semiconductor wafer for etching, doping, and other steps. The transfer of these patterns needs to be extremely accurate, so as to correspond to the patterns of other processes before and after, so as to manufacture precise integrated circuits. [0003] However, in the lithography step, when transferring the standard patterns on the mask to the surface of the wafer, deviations often occur, thereby affecting the performance of the semiconductor device. This deviation is related to the pattern characteristics to be transferred, the shape of the wafer, the type of light...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06F17/50H01L27/02
Inventor 杨育祥黄俊宪
Owner UNITED MICROELECTRONICS CORP