Apparatus for manufacturing thin film solar cell
A technology for solar cells and manufacturing devices, applied in final product manufacturing, sustainable manufacturing/processing, semiconductor/solid-state device manufacturing, etc., can solve problems such as high-frequency electrode potential difference, and achieve the effect of saving space
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no. 1 approach
[0088] Next, the thin-film solar cell manufacturing apparatus of the present invention will be described.
[0089] (Thin film solar cell manufacturing equipment)
[0090] figure 2 It is a schematic configuration diagram of a thin-film solar cell manufacturing device.
[0091] Such as figure 2 As shown, the thin-film solar cell manufacturing apparatus 10 includes: a film forming chamber 11 , a loading and unloading chamber 13 , a substrate loading and unloading chamber 15 , a substrate loading and unloading robot 17 , and a substrate storage box 19 .
[0092] The film formation chamber 11 forms a film of a bottom cell 104 (semiconductor layer) made of microcrystalline silicon on a plurality of substrates W simultaneously.
[0093] The loading / unloading chamber 13 accommodates the unprocessed substrate W1 carried into the film forming chamber 11 and the processed substrate W2 carried out from the film forming chamber 11 at the same time.
[0094] In the following descripti...
no. 2 approach
[0216] The following quotes the above Figure 5 and according to Figure 27 , the second embodiment of the present invention will be described. In addition, the same code|symbol is attached|subjected and demonstrated to the same member as 1st Embodiment (the following embodiment is also the same).
[0217] In this second embodiment, the following basic structure is the same as that of the above-mentioned first embodiment (the same applies to the following embodiments): the thin-film solar cell manufacturing apparatus 10 includes: Film formation of the bottom cell 104 (semiconductor layer) made of microcrystalline silicon; loading and unloading chamber 13, which can simultaneously accommodate the pre-processed substrate W1 carried into the film-forming chamber 11 and the processed substrate W2 carried out from the film-forming chamber 11; substrate loading and unloading The chamber 15 is used for loading and unloading the substrate W1 before processing and the substrate W2 af...
no. 3 approach
[0225] The following is based on Figure 28 A third embodiment of the present invention will be described.
[0226]The difference between the cathode unit 128 of the third embodiment and the cathode unit 118 of the second embodiment described above is as follows. That is, in the cathode unit 118 of the second embodiment described above, a pair of RF applying members 119 are disposed substantially parallel to each other with the insulating member 120 interposed therebetween, in the cathode unit 128 of the third embodiment, one The cathode RF applying members 119 are arranged substantially parallel to each other with the intervening blocking mechanism 130 for blocking electrical conduction.
[0227] The blocking mechanism 130 is composed of a flat ground plate 131 and a pair of guards 132 , 132 . The ground plate 131 is disposed substantially at the center in the thickness direction (vertical direction with respect to the plane of the shower plate 75 ) of the blocking mechanis...
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