Safeguard structure used in nuclepore membrane production process and production method of nuclepore membrane
A technology of nuclear microporous membrane and protective structure, applied in the field of protective structure, can solve the problems of low production efficiency, inability to meet market demands, etc., and achieve the effect of reducing the process and improving the etching speed.
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Embodiment 1
[0033] refer to figure 2 , a protective structure for nuclear microporous membrane production process of the present invention includes a thickness of 15 microns for forming the first membrane layer 1 of the first nuclear microporous membrane, which is considered unnecessary on one side of the first membrane layer The position of the micropore is coated with the first protective layer 2, and the other side of the first film layer is compounded with a thickness of 12 microns. The protective film layer 3 is compounded with A thickness of 15 microns is used to form the second membrane layer 4 of the second nuclear microporous membrane, and the second membrane layer 4 is coated with the second membrane layer 4 on the opposite side of the composite surface of the protective membrane layer, where micropores are not needed. Second protective layer 5.
Embodiment 2
[0035] refer to image 3 The difference between this embodiment and the first embodiment is that the first film layer 1 and the second film layer 4 are combined with the protective film layer through an adhesive after the release layer 6 is coated.
Embodiment 3
[0037] One of the nuclear microporous membrane production methods using the protective structure of embodiment two, characterized in that the steps are as follows:
[0038] (1) coating protective layer (imaging): the first film layer 1 and the second film layer 4 are considered to be coated with protective layer 2 (5) at positions where micropores are not needed on one side, and dried.
[0039] (2) Coating release layer 6 and adhesive: coating release layer 6 and adhesive sequentially on the sides of the first film layer 1 and the second film layer 4 that are not coated with protective layers.
[0040] (3) Two-time compounding: the two sides of the protective film layer are respectively bonded to the release layer 6 on the first film layer 1 and the second film layer 4 through an adhesive.
[0041] (4) Irradiation (bombardment): adjust the intensity of the irradiation energy to reach the intensity that can penetrate the first and second film layers respectively, and irradiate ...
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