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Substrate table, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus

A technology of lithography equipment and substrate table, which is applied in the direction of microlithography exposure equipment, optomechanical equipment, semiconductor/solid-state device manufacturing, etc., and can solve undesired problems

Active Publication Date: 2011-08-24
ASML NETHERLANDS BV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This requires additional or more powerful electric motors, and turbulence in the liquid may cause undesirable or unintended effects

Method used

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  • Substrate table, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus
  • Substrate table, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus
  • Substrate table, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus

Examples

Experimental program
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Embodiment Construction

[0024] figure 1 A lithographic apparatus according to an embodiment of the invention is schematically shown. The lithography equipment includes:

[0025] - an illumination system (illuminator) IL configured for conditioning a radiation beam B (eg, ultraviolet (UV) radiation or deep ultraviolet (DUV) radiation);

[0026] - a support structure (e.g. a mask table) MT configured to support a patterning device (e.g. a mask) MA and connected to a first positioning device PM configured to precisely position the patterning device MA according to determined parameters ;

[0027] - a support table (such as a sensor table for supporting one or more sensors or a substrate table WT configured to hold a substrate (such as a resist-coated substrate) W) configured for use according to the determination The second positioner PW that precisely positions the surface of the stage (eg, the surface of the substrate W) according to the parameters of the above; and

[0028] - a projection system ...

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PUM

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Abstract

The invention discloses a substrate table, a lithographic apparatus and a method for manufacturing a device using the lithographic apparatus. The table comprises: an encoder plate located on the table; a gap between the encoder plate and a top surface of the table, the gap located radially inward of the encoder plate relative to the periphery of the table; and a fluid extraction system with one or more openings in the surface of the gap to extract liquid from the gap.

Description

technical field [0001] The invention relates to a substrate table, a lithographic apparatus and a method of manufacturing devices using the lithographic apparatus. Background technique [0002] A lithographic apparatus is a machine that applies a desired pattern to a substrate, usually a target portion of the substrate. For example, lithographic equipment may be used in the manufacture of integrated circuits (ICs). In this case, a patterning device, alternatively referred to as a mask or reticle, may be used to generate the circuit pattern to be formed on the individual layers of the IC. The pattern can be transferred onto a target portion (eg, comprising a portion, one or more dies) on a substrate (eg, a silicon wafer). Typically, the pattern is transferred by imaging the pattern onto a layer of radiation-sensitive material (resist) disposed on the substrate. Typically, a single substrate will contain a network of adjacent target portions that are successively patterned....

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70341G03F7/70716G03F7/70775G03F7/2041H01L21/0274
Inventor 兼子毅之J·J·奥腾斯R·W·L·拉法瑞
Owner ASML NETHERLANDS BV