Light trapping structure for monocrystalline silicon solar cell
A light-trapping structure and solar cell technology, applied in the field of light-trapping structures, can solve the problems of increasing interfacial recombination loss and reducing battery efficiency, achieving good battery performance, improving light absorption efficiency, and increasing optical absorption efficiency
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0024] as attached figure 2 A light-trapping structure for a monocrystalline silicon solar cell shown, the light-trapping structure comprising: a textured p-type crystalline silicon substrate (5), on the p-type crystalline silicon substrate (5) n-type diffused doped layer (4), forming a pn junction; SiH 4 gas at a flow rate of 3.5 sccm and NH 3 Gas enters the PECVD deposition chamber at a flow rate of 50 sccm and hydrogen gas at a flow rate of 82 sccm, and a layer of Si with a thickness of less than 20 nanometers is deposited by PECVD on the n-type diffusion doped layer. 3 N 4 Passivation layer (3), its mass density is 2.3g / cm 3 , the refractive index is 2.3, and the hydrogen concentration is 20 atomic %. A thickness-controllable resin layer (1) containing metal nanoparticles (2) is coated on the passivation layer (3). Adjust the refractive index of the resin layer between air and Si 3 N 4 Between the passivation layer (3), the reflection loss can be further reduced. ...
Embodiment 2
[0026] Such as image 3 A light-trapping structure for a monocrystalline silicon solar cell is shown, the light-trapping structure includes: a p-type crystalline silicon substrate (5), and an n-type diffusion on the p-type crystalline silicon substrate (5) doped layer (4), forming a pn junction; depositing a layer of Si with a thickness less than 20 nanometers by PECVD on the p-type diffused doped layer 3 N 4 A passivation layer (3), depositing a monomolecular layer on the passivation layer (3) by means of heat conduction fumigation to improve adhesion. The surface-modified metal nanoparticles (2) are deposited directly onto the monolayer by a spray bake method. The preparation of the passivation layer is the same as in Example 1.
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 