Variable heat exchange device of polycrystal silicon ingot furnace and control method thereof
A polycrystalline silicon ingot furnace, heat exchange device technology, applied in the direction of polycrystalline material growth, chemical instruments and methods, crystal growth, etc., can solve the problems of inability to provide crystal temperature gradient, reduction of crystal growth rate, crystallization, etc.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0013] Such as figure 2 As shown, the variable heat exchange device of the polysilicon ingot furnace described in this embodiment mainly includes a heat insulation cage composed of a top heat insulation plate 1, a side heat insulation cylinder 2 and a bottom heat insulation plate 3, and an internal heating Device 4, graphite guard plate 5 and ceramic crucible 6, are provided with the heat exchange platform 7 that is graphite body at ceramic crucible 6 bottoms, as image 3 As shown, on the heat exchange platform 7, a number of vertically downward square cooling holes 11 are arranged in a matrix, a support plate 9 is provided at the bottom of the heat exchange platform 7, and a support plate 9 is provided between the heat exchange platform 7 and the support plate 9. Insulation plug 8, insulation plug 8 material is insulation carbon felt, as Figure 4 As shown, the thermal insulation plug 8 is a pyramid structure with a large bottom and a small top. The largest part of the bott...
Embodiment 2
[0016] The casting method grows polysilicon ingots, and when the silicon material melts, the elevating rod 10 drives the heat preservation plug 8 to move up to the highest position through the support plate 9, and fills the cooling holes 11 to enhance heat preservation. In the early stage of crystal growth, when the insulation plug 8 is moved down, the cooling holes 11 start to dissipate heat, and the temperature at the bottom of the crucible drops rapidly, forming sufficient supercooling degree, and crystal nuclei can be formed rapidly and orderly. During the crystallization stage, the insulation plug 8 continues to move downwards, and the cooling effect of the heat dissipation holes 11 is continuously strengthened to ensure that the upper silicon melt is in the hot zone and the lower crystal body is in the cold zone. This temperature gradient provides a strong driving force for crystal growth. In addition, by adjusting the speed at which the insulation plug 8 moves down, effe...
Embodiment 3
[0018] In the early stage of silicon material melting, let the insulation plug 8 move up to the highest position, fill the heat dissipation holes 11, and play a role in strengthening heat preservation. In the later stage of melting, move the insulation plug 8 slightly down, and the heat dissipation holes 11 Play the role of heat dissipation, control the bottom of the crucible at an appropriate temperature, and protect the seedlings from being completely melted. When entering the crystallization nucleation stage, continue to move down the insulation plug 8, the heat dissipation effect of the heat dissipation hole 11 is strengthened, the temperature at the bottom of the crucible drops rapidly, and sufficient supercooling is formed, so that the silicon melt grows upward under the induction of the incompletely melted seed crystal. During the crystallization stage, the insulation plug 8 continues to move downwards, and the cooling effect of the heat dissipation holes 11 is continuou...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 