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Variable heat exchange device of polycrystal silicon ingot furnace and control method thereof

A polycrystalline silicon ingot furnace, heat exchange device technology, applied in the direction of polycrystalline material growth, chemical instruments and methods, crystal growth, etc., can solve the problems of inability to provide crystal temperature gradient, reduction of crystal growth rate, crystallization, etc.

Inactive Publication Date: 2012-04-04
嘉兴嘉晶电子有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantage of this heat exchange method is that the heat exchange platform is a solid graphite body, the thickness of which is usually between 120mm and 160mm, its heat exchange capacity is very low, and it is passive and invariable. The heat that needs to be dissipated mainly diffuses outward through the surrounding crucible walls and graphite shields, which will cause the temperature of the silicon melt near the surrounding crucible to decrease much faster than the silicon melt at the bottom of the crucible, making the isothermal surface in the crucible unable to maintain a level , the crystal cannot be crystallized from bottom to top in the vertical direction, and the crystal quality is poor; in addition, this heat exchange method usually has a low heat exchange capacity in the later stage of crystal growth, and cannot provide sufficient temperature gradient for crystal growth, resulting in crystal growth The rate of
Therefore, the current thermal field structure of the ingot furnace has defects, resulting in low crystal quality and production efficiency

Method used

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  • Variable heat exchange device of polycrystal silicon ingot furnace and control method thereof
  • Variable heat exchange device of polycrystal silicon ingot furnace and control method thereof
  • Variable heat exchange device of polycrystal silicon ingot furnace and control method thereof

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Experimental program
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Effect test

Embodiment 1

[0013] Such as figure 2 As shown, the variable heat exchange device of the polysilicon ingot furnace described in this embodiment mainly includes a heat insulation cage composed of a top heat insulation plate 1, a side heat insulation cylinder 2 and a bottom heat insulation plate 3, and an internal heating Device 4, graphite guard plate 5 and ceramic crucible 6, are provided with the heat exchange platform 7 that is graphite body at ceramic crucible 6 bottoms, as image 3 As shown, on the heat exchange platform 7, a number of vertically downward square cooling holes 11 are arranged in a matrix, a support plate 9 is provided at the bottom of the heat exchange platform 7, and a support plate 9 is provided between the heat exchange platform 7 and the support plate 9. Insulation plug 8, insulation plug 8 material is insulation carbon felt, as Figure 4 As shown, the thermal insulation plug 8 is a pyramid structure with a large bottom and a small top. The largest part of the bott...

Embodiment 2

[0016] The casting method grows polysilicon ingots, and when the silicon material melts, the elevating rod 10 drives the heat preservation plug 8 to move up to the highest position through the support plate 9, and fills the cooling holes 11 to enhance heat preservation. In the early stage of crystal growth, when the insulation plug 8 is moved down, the cooling holes 11 start to dissipate heat, and the temperature at the bottom of the crucible drops rapidly, forming sufficient supercooling degree, and crystal nuclei can be formed rapidly and orderly. During the crystallization stage, the insulation plug 8 continues to move downwards, and the cooling effect of the heat dissipation holes 11 is continuously strengthened to ensure that the upper silicon melt is in the hot zone and the lower crystal body is in the cold zone. This temperature gradient provides a strong driving force for crystal growth. In addition, by adjusting the speed at which the insulation plug 8 moves down, effe...

Embodiment 3

[0018] In the early stage of silicon material melting, let the insulation plug 8 move up to the highest position, fill the heat dissipation holes 11, and play a role in strengthening heat preservation. In the later stage of melting, move the insulation plug 8 slightly down, and the heat dissipation holes 11 Play the role of heat dissipation, control the bottom of the crucible at an appropriate temperature, and protect the seedlings from being completely melted. When entering the crystallization nucleation stage, continue to move down the insulation plug 8, the heat dissipation effect of the heat dissipation hole 11 is strengthened, the temperature at the bottom of the crucible drops rapidly, and sufficient supercooling is formed, so that the silicon melt grows upward under the induction of the incompletely melted seed crystal. During the crystallization stage, the insulation plug 8 continues to move downwards, and the cooling effect of the heat dissipation holes 11 is continuou...

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Abstract

The invention discloses a variable heat exchange device of a polycrystal silicon ingot furnace. A heat exchange table made of graphite is arranged at the lower part of a ceramic crucible, the heat exchange table is provided with a plurality of vertical downward square heat dissipation holes arranged in a matrix, a supporting plate is arranged at the lower part of the heat exchange table, heat preservation plugs are arranged between the heat exchange table and the supporting plate, the heat preservation plugs are made of heat preservation carbon felt, the heat preservation plugs have pyramid structures with small bottoms and big tops, the biggest positions of the bottoms of the heat preservation plugs are just consistent with the sizes of the square heat dissipation holes, the number and the position arrangement of the heat preservation plugs correspond to those of the square heat dissipation holes, the supporting plate is fixed on a lifting rod, and the lifting rod passes through a bottom heat insulation plate from the outer part and extends into the inner part. According to the variable heat exchange device of the polycrystal silicon ingot furnace and the control method thereof, the variable heat exchange device is used in a thermal field, and the lifting rod drives the supporting plate and the heat preservation plugs to move up and down together, so that the heat dissipation capability of the heat dissipation holes is adjusted, the heat dissipation rate below the crystal can be actively controlled, and the growth rate of the crystal is effectively controlled.

Description

technical field [0001] The invention relates to the field of thermal fields of polysilicon ingot furnaces, in particular to a variable heat exchange device of polysilicon ingot furnaces and a control method thereof. Background technique [0002] The thermal field structure of the commonly used polysilicon ingot furnace is as follows: figure 1 As shown, the fixed top insulation board made of thermal insulation carbon felt, the liftable side insulation cylinder and the fixed bottom insulation board form a heat insulation cage. The heat exchange table is placed on the column in the heat insulation cage, and the The bottom and surroundings of the ceramic crucible full of silicon materials are protected by graphite shields. In the melting stage of the silicon material, the side heat insulation cylinder is lowered to zero, and the heat insulation cage is completely closed, and the silicon material in the crucible is heated by the heater until the silicon material is completely me...

Claims

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Application Information

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IPC IPC(8): C30B28/06C30B29/06
Inventor 杨建松甘新武
Owner 嘉兴嘉晶电子有限公司