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Solvent or solvent composition for printing

A solvent composition and solvent technology, which can be used in printing, application, household appliances, etc., can solve problems such as inconvenience of use, and achieve the effects of excellent solubility, low hygroscopicity, and suppression of component deterioration.

Inactive Publication Date: 2012-05-16
DAICEL CHEM IND LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, due to the ecotoxicity of glycol ether solvents, there is a problem of inconvenient use (non-patent document 1)

Method used

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  • Solvent or solvent composition for printing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0071] Put 20 g of propylene glycol methyl n-butyl ether (trade name "PMNB", manufactured by DAICEL Chemical Industry Co., Ltd., hereinafter sometimes referred to as "PMNB") and 20 g of distilled water into a 50 mL flask, stir for about 10 minutes, and then let stand for 10 minutes. Minutes, the moisture content of the organic phase was measured, and the moisture concentration in the 25°C environment was 0.7%.

[0072] The PMNB was added to four 50mL flasks, 20.00g was added to each flask, and 1.05g of a product with the trade name "ETHOCEL" (registered trademark) (ethyl cellulose, manufactured by DOW Co., Ltd.) was added to each of them. (5% solution), 1.28g (6% solution), 1.51g (7% solution), 1.74g (8% solution). Then, it was stirred at 65° C., left to stand, and naturally cooled to 25° C., then the solubility of ethyl cellulose was observed with the naked eye, and evaluated according to the following criteria.

[0073] evaluation standard

[0074] Ethyl cellulose is compl...

Embodiment 2

[0077] Add 20 g of propylene glycol methyl n-propyl ether (trade name "PMNP", manufactured by DAICEL Chemical Industry Co., Ltd., hereinafter, sometimes referred to as "PMNP") and 20 g of distilled water into a 50 mL flask, stir for about 10 minutes, and then let stand for 10 minutes. Minutes, the moisture content of the organic phase was measured, and the moisture concentration in an environment of 25° C. was 1.0%.

[0078] The solubility of ethyl cellulose was evaluated in the same manner as in Example 1 except that the PMNP was used instead of PMNB.

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PUM

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Abstract

The present invention provides a solvent or a solvent composition for printing patterns of solar cell, organic TFT, electronic paper or organic EL device, which has the following advantages: high solvability for resin additives such adhesive resin, and low hygroscopicity. The solvent or solvent composition for printing the patterns of the solar cell, organic TFT, electronic paper or organic ELD device through a printing method comprises a compound of propylene glycol dialkyl ether in which one bottom alkyl is methyl and the other is a straight-chain or branched-chain alkyl with 3-5 carbon atoms. Preferably at least one method which is selected from the following methods is adopted in the invention: ink-jet method, screen printing method, intaglio printing method, offset printing method, gravure printing method, micro-contact printing method and nanometer printing method.

Description

technical field [0001] The present invention relates to a solvent or a solvent composition used when forming a pattern by a printing method, which is less hygroscopic and exhibits excellent resin solubility. Background technique [0002] Conventionally, patterns of electronic components such as wiring boards and displays are often formed by a method called photolithography. Photolithography is a method of applying a paste composition on a substrate, exposing and developing a fine pattern, and removing unnecessary parts by etching to form a pattern. However, since this method usually requires etching waste liquid treatment equipment, the device itself is huge and requires a huge investment in equipment, resulting in low material use efficiency, cumbersome manufacturing processes, and poor productivity. In addition, it is difficult to pattern large-area substrates due to the limited capacity of the device. [0003] Therefore, in recent years, as a pattern forming method, a p...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09D11/02C09D11/14C09D11/10B41M5/00C09D11/033C09D11/08C09D11/106
CPCY02E10/50C07C43/04C09D11/033C09D11/52H01L21/4867H01L31/042H05B33/22
Inventor 铃木阳二赤井泰之
Owner DAICEL CHEM IND LTD