Device and method for preparing casting monocrystalline silicon
A single crystal silicon and seed crystal technology, applied in the field of solar photovoltaics, can solve the problems of increasing the production cost of the casting method, increasing the production cost, etc.
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Embodiment 1
[0055] Install the single crystal seed crystal on the clamping head 86 of the seeding device, and lift it into the gas guide tube 70 . 450 kg of primary polysilicon material was placed in a crucible, and 0.13 kg of dopant boron was added. The target resistivity after doping was 1.70 Ω·cm. The crucible 60 filled with materials is placed in the furnace body 10 to evacuate, and the vacuum state in the furnace alternates with the argon atmosphere during the heating stage, which is beneficial to the removal of impurities. When the silicon material is completely melted. Firstly, the temperature of the heater 95 is quickly lowered to 1420° C., and the seeding device is lowered, so that the seed crystal is contacted and infiltrated with the silicon liquid, and the seed crystal is melted for 2 cm. Enter the necking process. After the necking length reaches 50cm, the state enters the shoulder-releasing process. When the detector detects that the outer edge of the single crystal silic...
Embodiment 2
[0058] Install the single crystal seed crystal on the clamping head 86 of the seeding device, and lift it into the gas guide tube 70 . Place 480 kg of raw polysilicon material in the crucible, and put 0.16 kg of dopant boron (the weight of the dopant is related to the type and weight of the polysilicon material, which is the result of a formula calculation, and there is no strict restriction between the two. ratio). The target resistivity after doping was 1.80 Ω·cm. The crucible 60 filled with materials is placed in the furnace body 10 to evacuate, and the vacuum state in the furnace alternates with the argon atmosphere during the heating stage, which is beneficial to the removal of impurities. When the silicon material is completely melted. First, the temperature of the heater 95 is quickly lowered to 1418° C., and the seeding device is lowered to make the seed crystal contact and infiltrate the silicon liquid, and melt the seed crystal for 2 cm. Enter the necking process....
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