Method for directly forming pattern on polydimethylsiloxane (PDMS) through photoetching
A technology of lithography and graphics, applied in chemical instruments and methods, containers used in laboratories, and photoplate-making process on patterned surfaces, etc., can solve problems such as constraints, increased process time and cost, and high requirements, and achieve simplification Reliance on templates, low cost, and the effect of simple craftsmanship
Inactive Publication Date: 2012-07-11
CHINA NAT ACAD NANOTECH & ENG
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Problems solved by technology
However, the production of templates has high requirements on the environment and equipment, and requires facilities such as ultra-clean rooms, which increases the time and cost of the process, and the entire process will also be restricted by this key process.
Method used
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Embodiment
[0020] Embodiment: a kind of method (see accompanying drawing) that utilizes photolithography to directly form pattern on PDMS, it is characterized in that it comprises the steps:
[0021] ① The PDMS mixture is formed by mixing the PDMS matrix and the curing agent at a ratio of 10:1;
[0022] ② Dissolve benzophenone crystals in xylene to form a benzophenone solution; add benzophenone to PDMS to form PDMS sensitive to ultraviolet light; this mixture is called photosensitive PDMS;
[0023] ③ Soak the glass sheet in a mixture of sulfuric acid and hydrogen peroxide for 12 minutes, then soak and rinse it with acetone, methanol and deionized water respectively, and then dry it with nitrogen;
[0024] ④ Spin-coat the photosensitive PDMS on the glass sheet, place the photolithographic chromium mask plate used for photolithography on the glass sheet, and keep a certain gap between the chromium plate and the glass sheet; use ultraviolet light to expose it; Ultraviolet wavelength <365nm...
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The invention discloses a method for directly forming a pattern on polydimethylsiloxane (PDMS) through photoetching. The method is characterized by comprising the following steps of: (1) mixing a PDMS substrate and a curing agent to form a PDMS mixing agent; (2) dissolving benzophenone crystals in dimethylbenzene to form benzophenone solution, and adding benzophenone into the PDMS to form PDMS sensitive to ultraviolet light; (3) soaking a glass sheet in sulfuric acid and hydrogen peroxide mixed solution, soaking the glass sheet in acetone, methanol and deionized water sequentially, flushing the glass sheet until the glass sheet is clean, and blowing the glass sheet with nitrogen until the glass sheet is dry; (4) exposing the glass sheet with a lamp ultraviolet lamp; (5), after the glass sheet is exposed, drying the glass sheet, wherein the part of the PDMS, which is not exposed, is cured, and the part of the PDMS, which is exposed, is kept in the primary state; and (6) soaking the uncured PDMS in toluene to remove the uncured PDMS, flushing the glass sheet with isopropanol until the glass sheet is clean, and blowing the glass sheet with nitrogen until the glass sheet is dry, and thus the pattern is formed. The method is a novel process, which is low in cost, quick in speed and simple. The pattern is directly formed on the PDMS.
Description
(1) Technical field: [0001] The invention relates to a preparation method of a microfluidic chip, in particular to a method for directly forming patterns on PDMS by photolithography. (two) background technology: [0002] Laboratory-on-Chip (LOC) systems have various applications in chemistry and life sciences. Driven by the demand for low-cost, disposable devices, the LOC field is experiencing rapid development and growth. Many LOC devices are made of PDMS materials, which have many advantages over silicon and glass. One of the biggest points is its simple and cheap manufacturing process, which can realize fast graphic transfer. Its high optical transparency facilitates a wide variety of optical inspections and microscopy techniques. Due to its non-toxicity to cells and certain gas permeability, PDMS has become one of the most popular materials in biological research. PDMS can maintain good flexibility and stability in the range of -50°C to 200°C, which is a property that...
Claims
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IPC IPC(8): B01J19/00B01L3/00G03F7/00
Inventor 高鹏牟诗城徐超吴元庆屈怀泊
Owner CHINA NAT ACAD NANOTECH & ENG