Nonaqueous solvent system chemical nickel plating solution, and preparation method and application thereof
An electroless nickel plating, non-aqueous solvent technology, applied in liquid chemical plating, metal material coating process, coating, etc., can solve the problem of difficulty in obtaining uniform and stable plating, increasing the cost of electroless nickel plating, and a large number of pinholes on the surface of the plating and other problems, to achieve the effect of convenient preparation, low price and uniform size
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Embodiment 1
[0041] The preparation method of the non-aqueous solvent system electroless nickel plating solution of the present embodiment comprises the steps of: mixing dry choline chloride and ethylene glycol in a molar ratio of 1:1, heating and melting at 80°C, and obtaining after melting and cooling The liquid is the deep eutectic solvent. After the main salt of nickel chloride hydrate is dissolved in the deep eutectic solvent, Ni can be prepared. 2+ A non-aqueous solvent system electroless nickel plating solution with a concentration of 25g / L.
[0042] When plating the substrate to be plated, the substrate to be plated is pretreated in advance. In this embodiment, the pure copper substrate is used as the substrate to be plated, and the 10×20mm pure copper substrate is polished-degreasing-alkali washing-water washing-acid washing- After water washing-acetone washing-air drying treatment, then immerse in the electroless nickel plating solution of the example, implement electroless nicke...
Embodiment 2
[0050] At 80°C, dry choline chloride and ethylene glycol are heated, mixed and melted at a molar ratio of 1:2 to form a deep eutectic solvent as a solvent. Use nickel chloride hydrate as the main salt to prepare Ni 2+ The concentration is the plating solution of 25g / L. At 50, 60, 70, 80, and 90°C, electroless nickel plating was performed on pure copper substrates for 24h. The base pure copper substrate and its pretreatment methods are the same as those in Example 1.
Embodiment 3
[0055] At 80°C, heat, mix and melt dry choline chloride and 1,3 butanediol at a molar ratio of 1:2 to form a deep eutectic solvent as a solvent. Nickel nitrate is the main salt, and the preparation of Ni 2+ The concentration of the plating solution is 25g / L, and the wetting agent polyethylene glycol concentration is 0.5g / L. Under the condition of 60°C, electroless nickel plating was carried out on the pure copper substrate for 12h. The base pure copper substrate and its pretreatment methods are the same as those in Example 1. As a result, a bright silver-white pure metal nickel coating was obtained on the surface of the pure copper substrate with a film thickness of 30 microns.
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