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Focusing and leveling measurer

A measurement device and projection technology, applied in the field of photolithography, can solve the problems of measurement being greatly affected by the process, complex measurement branch structure, and large space occupation, so as to improve process adaptability, reduce complexity, and improve stability. Effect

Active Publication Date: 2014-07-16
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, non-contact photoelectric measurement technology is commonly used. In order to increase the measurement area and real-time performance, NIKON’s patent US6034780 adopts a multi-branch measurement mechanism that reflects back and forth on the surface to be measured. Such a mark on the surface to be measured Projection in different areas, the measurement is greatly affected by the process, and more measurement branches make the structure complex, occupy a large space, and design is difficult

Method used

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  • Focusing and leveling measurer
  • Focusing and leveling measurer
  • Focusing and leveling measurer

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Embodiment Construction

[0017] In the following, preferred embodiments according to the present invention will be described in detail with reference to the accompanying drawings. For the convenience of describing and highlighting the present invention, relevant components existing in the prior art are omitted from the drawings, and the description of these known components will be omitted.

[0018] Below in conjunction with accompanying drawing and specific implementation method, the present invention will be further described:

[0019] figure 1 Shown is a schematic structural view of the focusing and leveling measuring device according to the present invention. The measurement device includes: an illumination unit composed of a broadband light source 3 and an illumination mirror group 4, a projection unit composed of a marking plate 5, a front projection lens group 6, a projection rear lens group 8 and a beam splitting mechanism 9, and a coupling mechanism 10, Receive an imaging unit composed of a...

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Abstract

The invention discloses a focusing and leveling measurer. The focusing and leveling measurer comprises 1, an illumination unit with a broad band source and an illuminating mirror group, 2, a projection unit with a marking plate, a projection front lens group, a projection rear lens group and a beam splitting mechanism, 3, a receiving and imaging unit with a coupling mechanism, a receiving front lens group and a receiving rear lens group, and 4, a position detector unit. Lights transmitted by the illumination unit uniformly illuminate on the marking plate. A mark of the marking plate passes through the projection unit and then forms multiple marks on a detected surface of a detected target object, and the multiple marks are reflected by the detected surface and then pass through the receiving and imaging unit so that images of the multiple marks form on the position detector unit.

Description

technical field [0001] The invention relates to the field of lithography, in particular to a focusing and leveling measuring device applied to a lithography machine. Background technique [0002] A projection lithography machine is a device that projects a pattern on a mask onto a silicon wafer through an objective lens. In the projection exposure equipment, there must be an automatic focus control system to accurately bring the silicon wafer to the designated exposure position, and there are many different technical solutions for realizing this system. At present, non-contact photoelectric measurement technology is commonly used. In order to increase the measurement area and real-time performance, NIKON's patent US6034780 adopts a multi-branch measurement mechanism that reflects back and forth on the surface to be measured. Such a mark on the surface to be measured Projection in different areas, the measurement is greatly affected by the process, and more measurement branc...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20G03F9/00G01B11/24
Inventor 张冲陈飞彪李志丹
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD