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Multidirectional racetrack rotary cathode for pvd array applications

A technology of rotating target and rotating shaft, which is applied in the direction of vacuum evaporation plating, coating, discharge tube, etc., which can solve the problems of time-consuming, error-prone, and cost-intensive movable magnetic bar or yoke

Active Publication Date: 2013-09-18
APPLIED MATERIALS INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] However, movable bar magnets or yokes are cost-intensive and error-prone because movement of the bar magnet, such as rotation, is time-consuming and bar movement requires extensive hardware as well as software effort to drive the magnet assembly

Method used

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  • Multidirectional racetrack rotary cathode for pvd array applications
  • Multidirectional racetrack rotary cathode for pvd array applications
  • Multidirectional racetrack rotary cathode for pvd array applications

Examples

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Embodiment Construction

[0024] Reference will now be made in detail to various embodiments of the invention, one or more examples of which are illustrated in the accompanying drawings. In the following description of the figures, the same reference numerals represent the same components. In general, only the differences with respect to the respective embodiments are described. Each example is provided by way of explanation of the invention, and each example is not meant as a limitation of the invention. Furthermore, features illustrated or described as part of one embodiment can be used on or in conjunction with other embodiments to yield a still further embodiment. This description is intended to cover such modifications and variations.

[0025] figure 1 Illustrated is a deposition chamber suitable for a PVD process according to embodiments described herein. Typically, the chamber 100 includes a substrate support 105 adapted to transfer a substrate 110 . Furthermore, the chamber 100 includes a ...

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PUM

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Abstract

A cathode assembly (130; 200; 300; 400) for a sputter deposition apparatus and a method for coating a substrate is provided. The cathode assembly has a coating side for coating on a substrate. Further, the cathode assembly includes a rotary target assembly adapted for rotating a target material (210; 310; 410) around a rotary axis (220; 320; 420); at least a first magnet assembly (230; 330; 340; 430; 431; 432; 433) having an inner magnet pole and at least one outer magnet poles and being adapted for generating one or more plasma regions (240; 250; 340; 350; 440; 441; 442; 443). The cathode assembly (130; 200; 300; 400) has a first angular coordinate for a magnet pole, the magnet pole being provided for the coating side, and a second angular coordinate for a further magnet pole, the magnet pole being provided for the coating side; wherein the first angular coordinate (260; 360; 460) and the second angular coordinate (270; 370; 461) define an angle a larger than about 20 degrees and smaller than about 160 degrees.

Description

technical field [0001] Embodiments of the invention relate to cathode assemblies for deposition apparatus and methods for depositing thin films on substrates. Embodiments of the invention particularly relate to cathode assemblies for sputter deposition apparatuses, and methods for depositing thin films on substrates in sputter deposition apparatuses. In particular, embodiments relate to cathode assemblies having magnet assemblies and methods for depositing thin films using magnetic fields. Background technique [0002] Coating materials are useful in some applications and in some technical fields. For example, substrates for displays are often coated using a physical vapor deposition (PVD) process. Further applications of coating materials include heat shields, organic light-emitting diode (OLED) panels, and hard disks, CDs, DVDs, etc. [0003] Several methods are known for coating substrates. For example, the substrate may be coated by a PVD process, a chemical vapor de...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C23C14/35H01J37/34
CPCC23C14/3407C23C14/35H01J37/3452H01J37/3405H01J37/345H01J37/3455H01J37/32532
Inventor E·谢尔M·哈尼卡R·林德伯格M·班德尔A·洛珀K·施沃恩特兹F·皮耶拉利西J·刘
Owner APPLIED MATERIALS INC