Unlock instant, AI-driven research and patent intelligence for your innovation.

A surface mount inductance device and wafer-level manufacturing method thereof

A surface mount, wafer-level technology, applied in the field of surface mount inductors and their wafer-level manufacturing, can solve the problems of difficult ultra-thin packaging, lower assembly yield, low inductance precision, etc., to achieve high density The effects of mounting, improving inductance accuracy, and improving dimensional accuracy

Active Publication Date: 2016-02-10
JIANGYIN CHANGDIAN ADVANCED PACKAGING CO LTD
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

like figure 2 As shown in the figure on the right, as the inductance device continues to shrink, its own weight becomes lighter and lighter. If the wetting force between the two electrodes of the inductance and the solder is unbalanced during the surface mount process, one end of the inductance will warp, resulting in poor assembly. , greatly reducing the assembly yield
In addition, since the solder will climb to the side wall of the electrode, if the two inductors are too close to each other during assembly, solder bridges will easily appear. Therefore, the distance between the two devices needs to be opened when designing the circuit board, which will lose The circuit board area cannot achieve high-density mounting
[0003] In the LTCC process, the metal circuit used to form the inductor coil is formed by printing and sintering. Due to the limitation of the printing process capability, the dimensional accuracy of the metal circuit is not high, and it is impossible to achieve narrow-pitch circuit printing. Therefore, this process is used. Inductors have low precision, usually less than 4nH, the precision can only reach + / -0.3nH, which cannot meet the needs of high-efficiency RF systems
Additionally, if image 3 As shown, the inductor using the LTCC process is usually a multi-layer structure, and the lines are distributed in the entire thickness range of the inductor, so it is difficult to achieve ultra-thin packaging

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A surface mount inductance device and wafer-level manufacturing method thereof
  • A surface mount inductance device and wafer-level manufacturing method thereof
  • A surface mount inductance device and wafer-level manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0057] see Figure 4 and Figure 5 , a surface mount inductance device of the present invention, the metal wiring layer 200 is disposed on the surface of the substrate 110, Figure 5 In the metal wiring layer 200, only the metal wiring layer I 210 and the metal wiring layer II 220 are shown as an example. The metal wiring layer II 220 is arranged above the metal wiring layer I 210, and the two are connected through the dielectric layer via hole 401 to realize electrical communication. . The metal wiring layer I 210 and the metal wiring layer II 220 respectively extend to the electrode regions on both sides, and are respectively connected to the electrodes 300 of equal height on both sides. A metal protection layer 600 is provided inside the surface protection layer opening pattern 501. The metal protection layer 600 extends downwards to wrap the sidewall of the electrode 300. The material of the metal protection layer 600 is an inert metal such as nickel or gold. The metal p...

Embodiment 2

[0059] see Figure 4 and Figure 6 , a surface mount inductance device of the present invention differs from the first embodiment as follows, a passivation layer 700 may also be provided between the substrate 110 and the metal wiring layer 200 to improve the reliability of the inductance device. Figure 6 In the metal wiring layer 200, only the metal wiring layer I 210 and the metal wiring layer II 220 are shown as an example. The metal wiring layer II 220 is arranged above the metal wiring layer I 210, and the two are connected through the dielectric layer via hole 401 to realize electrical communication. . The metal wiring layer I 210 and the metal wiring layer II 220 respectively extend to the electrode areas on both sides, and are respectively connected to the electrodes 300 of equal height on both sides. If necessary, the metal wiring layer I 210 and the metal wiring layer II 220 can be bent. The cross-section of the surface protection layer opening pattern 501 is recta...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
lengthaaaaaaaaaa
lengthaaaaaaaaaa
widthaaaaaaaaaa
Login to View More

Abstract

The invention relates to a surface-mounted inductance device and a wafer-level manufacturing method thereof, belonging to the field of passive device manufacturing. It includes a substrate (110), more than one layer of metal wiring layers (200) forming the inductance structure of the central inductance coil area, and electrodes (300) in the electrode areas on both sides, and different metal wiring layers (200) are separated by a dielectric Layer through holes (401) are electrically connected, and two layers of metal wiring layer I (210) and metal wiring layer II (220) of the metal wiring layer (200) extend to the electrode areas on both sides, and are respectively equal to the two sides of the electrode area. The electrodes (300) are connected, and the surface protection layer (500) is covered on the surface of the uppermost metal wiring layer (200). The present invention manufactures structures such as inductance and electrodes on the surface of the wafer through the wafer-level rewiring process, and the obtained surface mount inductive device has higher inductance accuracy, thinner thickness, and higher reliability, and can overcome one-sided warping of mounting Defects, to achieve high-density placement.

Description

technical field [0001] The invention relates to a surface-mounted inductance device and a wafer-level manufacturing method thereof, belonging to the field of passive device manufacturing. Background technique [0002] Inductors are essential components in electronic devices. With the miniaturization trend of electronic devices, especially handheld electronic devices such as mobile phones, the size of inductors is getting smaller and smaller. At present, the RF inductor models for wireless communication mainly have 0201 size and 0402 size (imperial system). Among them, the package length of the 0201 size model is between 500 microns and 700 microns, the width is between 250 microns and 350 microns, and the height is 250 microns. Microns to 350 microns; 0402 size models have packages with lengths between 900 microns and 1100 microns, widths between 400 microns and 600 microns, and heights between 450 microns and 550 microns. Traditional inductors are mainly made by multi-laye...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L23/528H01L21/02H01F17/02
Inventor 郭洪岩卞新海张黎陈锦辉赖志明
Owner JIANGYIN CHANGDIAN ADVANCED PACKAGING CO LTD