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Vapor phase growth device

A technology of vapor phase growth and positioning device, which is applied in the direction of electrical components, transportation and packaging, gaseous chemical plating, etc., can solve the problems of low production efficiency, poor operation efficiency, and re-transporting the base, and achieve the effect of improving operation efficiency

Inactive Publication Date: 2013-12-11
NIPPON SANSO CORP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0017] However, in the conventional example, the position alignment of the base is performed by the operator in the exchange box, but this operation has a problem of poor operation efficiency due to the need for caution.
[0018] In addition, if a misalignment occurs in the exchange box, the base needs to be re-aligned. However, once the base is returned to the exchange box and the position is aligned, the base needs to be transported again.
[0019] However, if the base is retransported, it takes time and there is a problem of low production efficiency

Method used

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  • Vapor phase growth device
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Examples

Experimental program
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Embodiment Construction

[0029] Such as figure 1 As shown, the vapor growth apparatus 1 according to this embodiment includes: a reaction furnace 5 with a base 3 detachably installed for vapor growth; a transport robot (not shown), a transport base 3, and a glove box 9 for storage There are a transport robot and a reaction furnace 5; an exchange table 11, which is arranged in the glove box 9 to temporarily place the base 3 when the base 3 is exchanged; and an exchange box 13, which is arranged on the side wall of the glove box 9 for the base 3, in the vapor growth apparatus 1, the exchange table 11 includes a positioning device 15 that rotates when the susceptor 3 is placed and stops at a predetermined rotation position to determine the position of the susceptor 3 in the rotation direction (see image 3 ).

[0030] The details are described below.

[0031]

[0032] Base 3 as figure 2 As shown, it is composed of a circular disk having an opening 17 in the center and having an overall shape of an annular ...

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Abstract

The present invention provides a vapor phase growth device (1) provided with a reactor (5) in which a susceptor (3) is detachably installed to perform vapor phase growth, a transfer robot which transfers the susceptor (3), a glove box (9) in which the transfer robot and the reactor (5) are housed, an exchange table (11) which is installed in the glove box (9) and on which a susceptor (3) is temporarily mounted when susceptors (3) are exchanged, and an exchange box (13) which is provided on the sidewall of the glove box (9) to perform an exchange of the susceptors. The exchange table is provided with a positioning unit which determines the position in the rotation direction of the susceptor by rotating when the susceptor is mounted and stopping at a predetermined rotation position.

Description

Technical field [0001] The invention relates to a vapor-phase growth device that supplies vapor-phase raw materials while heating a substrate to deposit a thin film on the substrate. [0002] This application claims priority on the basis of Japanese Patent Application No. 2011-077390 filed in Japan on March 31, 2011, and the content is cited here. Background technique [0003] As a vapor growth apparatus that heats a substrate held on a susceptor to a predetermined temperature and supplies a raw material gas into the reaction chamber to deposit (grow) a thin film on the substrate surface, the following vapor growth apparatus is known: It is equipped with a mechanism that rotates the base in order to uniformly form a thin film on a plurality of substrates, and rotates the substrate placing member (substrate tray) on which the substrate is placed according to the rotation of the base, thereby rotating and revolving the substrate during film formation (Refer to Patent Document 1). [...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/683C23C16/458H01L21/205H01L21/677
CPCC23C16/4584H01L21/67754H01L21/68764H01L21/68771C23C16/458
Inventor 内藤一树山口晃内山康右山本淳
Owner NIPPON SANSO CORP