Transparent conductive film, manufacturing method thereof, and touch device using the transparent conductive film
A technology of transparent conductive film and manufacturing method, which is applied in the direction of electrical digital data processing, input/output process of data processing, instruments, etc., and can solve problems such as large thickness drop, unevenness of visible area, creases of visible area, etc.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0064] ITO was plated on the substrate by magnetron sputtering to obtain an ITO film with a thickness of 10 nm. The acid-resistant etching method is used to etch the aging-treated ITO film. The specific process is: attach a layer of acid-resistant film to the ITO film, and then perform UV (ultraviolet) drying. After UV drying, the acid-resistant film is acid-resistant and not alkali-resistant. First pickling and then alkali cleaning to etch out the required in-plane ITO conductive lines, and form a sensing conductive layer including a plurality of sensing electrodes arranged at intervals on the substrate.
[0065] The silver paste is screen-printed on the substrate by screen printing, and the electrode leads and electrode blocks are obtained directly and synchronously (the models of the electrode leads and electrodes are pre-set on the screen). Then the silver paste is baked, so that the silver paste is fixed and shaped, and a transparent conductive film is obtained. Wherein,...
Embodiment 2
[0067] ITO was plated on the substrate by vacuum evaporation to obtain an ITO film with a thickness of 15 nm, and the substrate coated with the ITO film was subjected to aging treatment. Then, the silver paste is screen-printed onto the substrate coated with the ITO film by screen printing to obtain an intermediate product of the transparent conductive film, and the intermediate product is subjected to UV drying.
[0068] The laser etching method is used to simultaneously carry out laser etching on the ITO Film and the silver wiring, and laser out the required in-plane ITO conductive lines, electrode leads and electrode blocks. Then the silver paste is baked, so that the silver paste is fixed and shaped, and a transparent conductive film is obtained. Wherein, the thickness of the electrode leads and the electrode blocks is 2 microns.
Embodiment 3
[0070] ITO was plated on the substrate by magnetron sputtering to obtain an ITO film with a thickness of 20 nm. The acid-resistant etching method is used to etch the aging-treated ITO film. The specific process is: attach a layer of acid-resistant film to the ITO film, and then perform UV (ultraviolet) drying. After UV drying, the acid-resistant film is acid-resistant and not alkali-resistant. First pickling and then alkali cleaning to etch out the required in-plane ITO conductive lines, and form a sensing conductive layer including a plurality of sensing electrodes arranged at intervals on the substrate.
[0071] The silver paste is screen-printed on the substrate by screen printing, and then the silver traces are etched by laser etching, and the electrode leads and electrode blocks are obtained indirectly and synchronously. Then the silver paste is baked, so that the silver paste is fixed and shaped, and a transparent conductive film is obtained. Wherein, the thickness of t...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 