Manufacturing technology of glue homogenizing plate

Abstract

A manufacturing technology of a glue homogenizing plate comprising the following steps: (1) polishing: preparing a glass substrate with a corresponding size according to the size of the glue homogenizing plate to be produced, subjecting the glass substrate to a polishing treatment, wherein the polishing treatment comprises a coarse polishing treatment and a fine polishing treatment; (2) washing: arranging a support to support the polished glass substrate in the water tank of a washing machine, arranging an air knife in the second section to dry the glass substrate; (3) film coating: first electroplating a layer of nitrided metal film on the glass substrate, then electroplating a layer of nitrided metal film and a layer of oxidized metal film; (4) glue coating: painting a layer of photoresist on the film of the glass substrate, wherein the photoresist is dropwise added when the glass substrate rotates at the same time, and a static dropwise adding technology is adopted; (5) film hardening: after the glue coating process, the glass substrate firstly is horizontally placed, and then vertically placed so as to harden the film. Through improvements on technological parameters in each process, the manufacturing technology can produce large-sized glue homogenizing plate with abnormal sizes on the basis of manufacture equipment which is used for manufacturing conventional glue homogenizing plates with normal sizes, and moreover the production cost is largely reduced.

Description

technical field [0001] The invention relates to the manufacture of offset plates, in particular to the manufacturing process of large-size offset plates. Background technique [0002] The offset plate is a hard-surface photomask base plate, which has the characteristics of high photosensitive sensitivity, high resolution, low defect density, good wear resistance, easy cleaning, long service life, etc. It is widely used in IC, LCD, The production of mask plates for PCB, PDP and other products is the mainstream photosensitive material for the production of current and future microfabrication photomasks. [0003] The offset plate has several conventional sizes, such as 450mm*550mm, 406.4mm*457.2mm, etc. Correspondingly, the production equipment of the offset plate is also equipped according to its conventional size. Some production equipment or other matching equipment, the former will have a certain impact on the stability of the manufacturing process, and the latter will gre...

AI Technical Summary

Problems solved by technology

[0003] The offset plate has several conventional sizes, such as 450mm*550mm, 406.4mm*457.2mm, etc. Correspondingly, the production equipment of the offset plate is also equipped according to its conventional size. Some production equipment or other matching equipment, the former will have a certain impact on the stability of the manufacturing process, and the latter will greatly increase the production cost. With production equipment and process standards, there will be a series of problems, such as the range of the swing arm of the polishing machine is exceeded, the traces of polishing powder cannot be cleaned, the power of the spin coater is too small, the inertia is too large, etc.

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