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A kind of preparation method of high-purity submicron ZNS powder

A sub-micron, high-purity technology, applied in the chemical industry, can solve the problems of complex process, high equipment investment, and low product purity, and achieve the effect of simple process, low equipment requirements, and improved product purity.

Active Publication Date: 2016-01-13
山东大耀特种材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] At present, the preparation of ZnS powder materials mainly adopts physical methods such as γ-ray radiation method, microwave radiation method, vapor phase deposition method, and solid-phase method, as well as chemical methods such as sol-gel method and hydrothermal method. Physical methods often require more investment in equipment. High or high energy consumption, which is not conducive to saving costs and reducing energy consumption, while the ordinary solution method requires a certain temperature and pressure, the particle size of the product is difficult to control, the shape is irregular, the crystallinity is poor, and the process is relatively complicated
ZnS phosphors produced by traditional methods often have large particle sizes, often between several microns or even tens of microns, and the purity of the product is not high, which is not conducive to practical application

Method used

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  • A kind of preparation method of high-purity submicron ZNS powder
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  • A kind of preparation method of high-purity submicron ZNS powder

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Embodiment 1

[0039] Example 1, a method for preparing high-purity submicron ZnS powder, including the following steps:

[0040] (1) Configure precursor solution

[0041] The high purity NaOH powder, H 2 SO 4 The solutions are respectively dissolved in deionized water and configured into aqueous solutions of different concentrations, where:

[0042] The concentration of NaOH (analytical pure) solution is 600g / L deionized water;

[0043] H 2 SO 4 (Analytical pure) The solution concentration is 280g / L deionized water;

[0044] (2) ZnSO 4 Preparation of precursor solution

[0045] Will configure the thin H 2 SO 4 The solution is placed in reactor A, and high-purity ZnO powder is added to it. After the reaction is complete, stop adding ZnO powder and let stand for 3 hours to obtain high-purity ZnSO 4 Transparent solution. During the reaction, the solution was stirred at high speed.

[0046] (3) Preparation of NaHS precursor solution

[0047] Place the configured NaOH solution in reactor B, and at the same ...

Embodiment 2

[0057] Embodiment 2, a method for preparing high-purity submicron ZnS powder, includes the following steps:

[0058] (1) Configure precursor solution

[0059] The high purity NaOH powder, H 2 SO 4 The solutions are respectively dissolved in deionized water and configured into aqueous solutions of different concentrations, where:

[0060] The concentration of NaOH (analytical pure) solution is 800g / L deionized water;

[0061] H 2 SO 4 (Analytical pure) The solution concentration is 300g / L deionized water;

[0062] (2) ZnSO 4 Preparation of precursor solution

[0063] Will configure the thin H 2 SO 4 The solution is placed in reactor A, and high-purity ZnO powder is added to it. After the reaction is complete, stop adding ZnO powder and let stand for 5 hours to obtain high-purity ZnSO 4 Transparent solution. During the reaction, the solution was stirred at high speed.

[0064] (3) Preparation of NaHS precursor solution

[0065] Place the configured NaOH solution in reactor B, and at the sam...

Embodiment 3

[0075] Embodiment 3, a method for preparing high-purity submicron ZnS powder, includes the following steps:

[0076] (1) Configure precursor solution

[0077] The high purity NaOH powder, H 2 SO 4 The solutions are respectively dissolved in deionized water and configured into aqueous solutions of different concentrations, where:

[0078] The concentration of NaOH (analytical pure) solution is 1000g / L deionized water;

[0079] H 2 SO 4 (Analytical pure) The solution concentration is 380g / L deionized water;

[0080] (2) ZnSO 4 Preparation of precursor solution

[0081] Will configure the thin H 2 SO 4 The solution is placed in reactor A, and high-purity ZnO powder is added to it. After the reaction is complete, stop adding ZnO powder and let stand for 6 hours to obtain high-purity ZnSO 4 Transparent solution. During the reaction, the solution was stirred at high speed.

[0082] (3) Preparation of NaHS precursor solution

[0083] Place the configured NaOH solution in reactor B, and at the sa...

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Abstract

The invention discloses a method for preparing high-purity submicron ZnS powder. The method comprises the following steps: filling an H2SO4 deionized water solution in a reaction still A, adding high-purity ZnO powder into the H2SO4 deionized water solution, and standing after reaction is finished to obtain a high-purity ZnSO4 transparent solution; filling a NaOH solution into a reaction still B, simultaneously introducing H2S gas into the reaction still B, and standing to obtain a high-purity NaHS transparent solution; adding sodium lauryl sulfate into the ZnSO4 transparent solution, adding the NaHS solution after agitating, continuously agitating after reaction is finished, and standing to obtain precipitates; carrying out washing, draining, drying, ammonia catalytic dehydration and de-oxygenation to obtain the high-purity submicron ZnS powder. The product purity reaches more than 99.9%. The more important is that the product grain diameter is small and is in a range between 300nm and 500nm, and the grain diameter of the ZnS powder prepared by a traditional method is always between several micrometers and a dozen micrometers at preset. The use of the sodium lauryl sulfate as a surfactant solution is favorable to agglomeration and cementation among the particles. The dispersion degree of the particles is enhanced, and the surfaces of the particles are more regular.

Description

Technical field [0001] The invention relates to a preparation method of ZnS powder, in particular to a preparation method of high-purity submicron ZnS powder that can be used in the fields of paint, pigment, luminescent powder, optical coating, fluorescent screen, plastics, rubber, aerospace, etc. , Belongs to the field of chemical technology. Background technique [0002] As an important group II and VI compound semiconductor material, the research on ZnS has a history of more than 130 years since it was discovered by the French chemist Sidot in 1868. Because of its excellent physical properties, such as wide band gap, high refractive index, and visible light The high transmittance in the range and the huge application potential in the fields of applied optics, electronics and optoelectronic devices have attracted great attention. [0003] ZnS is a direct wide band gap semiconductor material with a band gap of 3.68-3.8eV. Through doping, it can achieve high-efficiency visible lig...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01G9/08C09K11/56
Inventor 王强
Owner 山东大耀特种材料有限公司