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Particle collection device and tail gas treatment system

A technology for particle collection and tail gas treatment, which is applied in combined devices, dispersed particle filtration, and dispersed particle separation. It can solve the problems of difficult to effectively collect tail gas particles and high particle size of tail gas from tail gas treatment devices, and achieve the effect of particle size reduction.

Inactive Publication Date: 2014-10-22
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The embodiment of the present invention provides a particle collection device and an exhaust gas treatment system equipped with the particle collection device, which solves the problem that it is difficult for the existing particle collection device to effectively collect the particles in the exhaust gas, which leads to entering the next stage of the exhaust gas treatment device. The exhaust gas still has technical problems with very high granularity

Method used

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  • Particle collection device and tail gas treatment system
  • Particle collection device and tail gas treatment system
  • Particle collection device and tail gas treatment system

Examples

Experimental program
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Effect test

Embodiment 1

[0028] Such as figure 1 As shown, the particle collection device provided by the embodiment of the present invention includes a pipe body 1 and a filter screen 2 for treating the exhaust gas generated in the semiconductor etching process. The lower part of the pipeline body 1 is an air inlet, which is connected to a dry pump (not shown in the figure) through a section of pipeline 3, and the dry pump is used to extract the exhaust gas generated in the process chamber of the etching process. The upper part of the pipeline body 1 is an air outlet, which is connected to the exhaust gas treatment device of the next stage. The filter screen 2 is arranged inside the pipeline body 1 and covers the air outlet. The filter screen 2 in the embodiment of the present invention is preferably a filter screen with a specification of 80 meshes, that is, the aperture of the filter screen 2 is within 0.2 mm.

[0029] Because the filter screen 2 covers the air outlet from the inside of the pipe ...

Embodiment 2

[0033] This embodiment is basically the same as Embodiment 1, and improvements are made on the basis of Embodiment 1. Such as Figure 4 As shown, in this embodiment, the pipe body 1 is provided with a spray device 7 . By adjusting the appropriate spraying range, the water droplets sprayed by the spraying device 7 can have a good sedimentation effect on the particles, and at the same time, the water droplets can also play a certain cooling effect on the exhaust gas during the sedimentation process.

Embodiment 3

[0035] This embodiment is basically the same as Embodiment 1, and improvements are made on the basis of Embodiment 1. Such as Figure 5 with Image 6 As shown, in this embodiment, a cooling pipeline 8 is provided on the inner wall or the outer wall of the pipeline body 1, so that the cooling pipeline 8 can be used to cool the exhaust gas in the particle collection device. Such as Figure 5 As shown, if the cooling pipeline 8 is provided on the inner wall of the pipeline body 1 , the particles will be deposited on the tube wall of the cooling pipeline 8 more concentratedly. Such as Image 6 As shown, if the cooling pipeline 8 is provided on the outer wall of the pipeline body 1 , more particles will be deposited on the inner wall of the pipeline body 1 , and less will fall to the bottom of the pipeline body 1 .

[0036] Of course, in other embodiments, cooling pipelines can also be provided on both the inner wall and the outer wall of the pipe body, and the cooling pipeline...

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Abstract

The embodiment of the invention discloses a particle collection device and a tail gas treatment system provided with the same, belongs to the technical field of semiconductor processing, and solves the technical problem that a conventional particle collection device cannot effectively collect particulate matters in tail gas, as a result, the tail gas going into a next-stage tail gas treatment device still has high granularity. The particle collection device comprises a pipeline body and a filter screen; the underneath of the pipeline body is provided with a gas inlet, and the upward side of the pipeline body is provided with a gas outlet; the filter screen is arranged inside the pipeline body, and covers the gas outlet. The particle collection device and the tail gas treatment system are used for treating tail gas generated in a semiconductor etching process.

Description

technical field [0001] The invention belongs to the technical field of semiconductor processing, and in particular relates to a particle collection device and an exhaust gas treatment system provided with the particle collection device. Background technique [0002] In the process of semiconductor processing, etching process is one of the important processes. The semiconductor etching process will produce a large amount of exhaust gas, and the generated exhaust gas contains many particles, so the exhaust gas generated by the etching process needs to be treated. [0003] The current exhaust gas treatment system includes molecular pumps, dry pumps and particle collection devices. Among them, the particle collection device is mainly composed of a pipeline body. The lower part of the pipeline body is the air inlet, and the upper part is the gas outlet. The pipe of the particle collection device enters the particle collection device, and the diameter of the pipe body of the par...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D46/24B01D50/00
Inventor 侯宁
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD