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A mask plate and exposure method

An exposure method and mask technology, which are applied in the field of mask and exposure, can solve the problems of high cost, poor competitiveness, and many masks of liquid crystal displays, and achieve the goals of improving competitiveness, increasing production capacity, and reducing the number of uses Effect

Active Publication Date: 2018-01-09
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The inventors have found that in the prior art, the light-shielding pattern and the light-transmitting pattern on one mask are fixed, therefore, only one layer of structure can be formed by using one mask, so that in the manufacturing process of the liquid crystal display, it is necessary to The number of masks used is large, resulting in high cost, low production capacity and poor competitiveness of liquid crystal displays

Method used

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  • A mask plate and exposure method
  • A mask plate and exposure method
  • A mask plate and exposure method

Examples

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Embodiment 1

[0039] An embodiment of the present invention provides a mask, and a multi-layer structure can be formed by using the mask.

[0040] Specifically, the mask includes at least two superimposed sub-masks, each sub-mask includes a light-shielding pattern and a light-transmitting pattern, and the vertical projections of all the light-shielding patterns on the mask do not overlap. exemplarily, as figure 1 As shown, the mask includes two upper and lower first sub-masks 1 and second sub-masks 2, wherein the first sub-mask 1 includes a light-shielding pattern 11 and a light-transmitting pattern 12, and the second sub-mask 1 includes a light-shielding pattern 11 and a light-transmitting pattern 12. The mask plate 2 includes light-shielding patterns 21 and light-transmitting patterns 22 .

[0041] It should be noted that the word "superimposed" above only defines the upper and lower relationship of multiple sub-masks, and does not limit other features. Multiple sub-masks can be actually...

Embodiment 2

[0052] An embodiment of the present invention provides an exposure method, the exposure method includes at least two exposure processes, each exposure process includes Figure 5 Steps shown:

[0053] Step S501 , forming a photoresist on the substrate.

[0054] The photoresist can be formed on the substrate by methods such as spin coating. It should be noted that if the photoresist is used to protect the underlying film layer from being etched, the photoresist must be formed on the substrate before the photoresist is formed on the substrate. The corresponding film layer is formed on it.

[0055] Step S502, use a mask to cover the substrate on which the photoresist is formed, the mask includes at least two superimposed sub-masks, each sub-mask includes a light-shielding pattern and a light-transmitting pattern, and all the light-shielding patterns are on the mask. The vertical projections on the .

[0056] Step S503 , focusing the exposure light on a sub-mask to expose the ph...

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Abstract

The embodiment of the invention discloses a mask plate and an exposure method, which relate to the field of display technology, and a multilayer structure can be formed by using the mask plate. The mask includes at least two superposed sub-masks, each sub-mask includes a light-shielding pattern and a light-transmitting pattern, and vertical projections of all the light-shielding patterns on the mask have no overlap.

Description

technical field [0001] The present invention relates to the field of display technology, in particular to a mask plate and an exposure method. Background technique [0002] In the manufacturing process of the liquid crystal display, multiple patterning processes are required to form each layer structure. Usually, the patterning process includes steps such as coating photoresist, using a mask to cover, exposing, developing, etching, and stripping the photoresist. [0003] Specifically, the mask plate includes a light-shielding pattern and a light-transmitting pattern. Exemplarily, when the photoresist coated on the substrate in the patterning process is a positive photoresist, during the exposure process, the light-shielding pattern on the mask plate blocks the light. Block the light, so that the photoresist under the shading pattern is not irradiated by light, the photoresist is not denatured, and remains in the subsequent development process, the light-transmitting pattern...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/00G03F7/20
Inventor 王宝强朴相镇
Owner BOE TECH GRP CO LTD