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A method to eliminate the influence of material on the measurement accuracy of spectral reflectance

A technology of spectral reflectance and measurement accuracy, which is applied in the field of using adaptive band selection to eliminate the influence of materials on the measurement accuracy of spectral reflectance, and achieves the effect of high correction accuracy

Active Publication Date: 2017-10-13
ZHEJIANG UNIV
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  • Description
  • Claims
  • Application Information

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Problems solved by technology

It can be seen from the correction model that this kind of correction model is empirical, and only local band information is selected to participate in the correction, which may not conform to the optimal correction model in practical applications.

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  • A method to eliminate the influence of material on the measurement accuracy of spectral reflectance
  • A method to eliminate the influence of material on the measurement accuracy of spectral reflectance
  • A method to eliminate the influence of material on the measurement accuracy of spectral reflectance

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Embodiment 1

[0034] Embodiment 1, solution of correction coefficient H.

[0035] The purpose of the present invention is to eliminate the impact of materials on the measurement accuracy of spectral reflectance, and its specific implementation steps are as follows:

[0036] (1) Measure the spectral reflectance of the sample with a multispectral imaging system and a spectrophotometer, respectively,

[0037] The spectral reflectance obtained by measuring the color sample with a multispectral imaging system is The spectrophotometer measures the spectral reflectance r of the color sample. In this embodiment, the number of band samples whose spectral reflectance is in the visible light range is 31, namely and r are both 31×1 column vectors.

[0038] (2) from Among the 31 bands of , three bands a, b, and c are randomly selected to participate in the correction, and the band combination is expressed as a binary vector,

[0039]

[0040] Where 1 represents the band involved in the correct...

Embodiment 2

[0055] In embodiment 2, the correction coefficient H obtained in embodiment 1 is used to correct the spectral reflectance of two different materials.

[0056] 1. Measure the spectral reflectance of two different materials (Pantone sample and Paper sample) with a multispectral imaging system, and the obtained spectral reflectance is The number of spectral reflectance band samples in the visible light range is 31, 31×M 1 matrix, 31×M 2 matrix, M 1 , M 2 The number of color samples for the two materials, respectively.

[0057] 2. according to the correction factor H that embodiment 1 obtains, by formula Complete the correction of spectral reflectance, where

[0058] Comparing the corrected spectral reflectance R' with the standard spectral reflectance R (measured by a spectrophotometer), the root mean square error of the spectrum is shown in Table 1, and the color difference under different light sources is shown in Table 2. It can be seen from Table 1 and Table 2 t...

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Abstract

The invention discloses a method for eliminating influences of materials on the measurement accuracy of the spectral reflectivity. The method includes the steps that the spectral reflectivity of a measured sample and the standard spectral reflectivity are obtained through a multi-spectral imaging system and a spectrophotometer respectively; a waveband combination taking part in correction is obtained with a self-adaptive waveband selection method, a correction matrix of the spectral reflectivity is worked out according to a binary differential evolution algorithm of the obtained waveband combination, and thus the spectral reflectivity is corrected. According to the method, the most appropriate waveband combination can be selected from all sampling wavebands of the spectral reflectivity according to the binary differential evolution algorithm to take part in correction, a local correction model adopted for the method has the self-adaptation characteristic compared with an existing correction method, and thus the correction accuracy is improved.

Description

technical field [0001] The invention relates to a method for correcting spectral reflectance, in particular to a method for eliminating the influence of materials on the measurement accuracy of spectral reflectance by using adaptive band selection. Background technique [0002] The multispectral imaging system can realize spectral measurement with the spatial resolution of the camera by collecting images of objects in different bands, so it is widely used in electronic archives, fine printing and dyeing, color printing and other fields. Reconstruction of spectral reflectance is the core problem in multispectral imaging system. The reconstruction process is to use a certain number of color samples and spectral reflectance reconstruction algorithm to obtain the spectral transformation matrix of the system. Due to the particularity of the multispectral imaging system in terms of geometric structure and measurement principle, and the differences between BRDFs of different materi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G06F19/00G01N21/01
Inventor 沈会良郑芝寰
Owner ZHEJIANG UNIV