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A kind of sapphire crystal guided mode growth device and growth method

A sapphire crystal and growth device technology, applied in the field of crystal manufacturing, can solve problems affecting the crystal interface, pollution of new raw materials, material corrosion, etc., and achieve the effect of improving crystal quality

Inactive Publication Date: 2017-02-08
JIANGSU CEC ZHENHUA CRYSTAL TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The above-mentioned mold is directly placed in the crucible, and the drop of the liquid level in the crucible during the process will cause changes in the transportation of raw materials at the top of the mold, thereby affecting the crystallization interface and reducing the quality of the crystal. There are a lot of raw materials, and the leftover raw materials will pollute the new raw materials when they are used again, and it will cause great waste if they are not used. The life of the mold is also reduced due to the leftover raw materials, and the general feeding system, due to the location of the feeding device , the raw material is often softened and viscous before it reaches the target position, or the raw material steam in the crucible prevents the raw material from reaching the target position
At the same time, because the sapphire crystal selected and grown by the conductive film method adopts the graphite insulation system, it will also cause corrosion to thermal field materials such as Mo / W, which greatly reduces the service life of the metal thermal field.

Method used

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  • A kind of sapphire crystal guided mode growth device and growth method
  • A kind of sapphire crystal guided mode growth device and growth method
  • A kind of sapphire crystal guided mode growth device and growth method

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Embodiment 1

[0035] Such as figure 1 As shown, the present invention discloses a sapphire crystal guided mode growth device, comprising a crystal growth furnace, which has an outer crucible 6 for loading alumina solution 7, and one placed above the crucible mouth of the outer crucible 6 and connected with the A hanging plate 2 fitted to the mouth of the crucible and an inner crucible 4 placed upside down in the outer crucible 6;

[0036] A mold 1 is installed at the center of the hanging pan 2, and the circumference of the hanging pan 2 is evenly distributed in a ring shape with a number of suspenders 3 that drive the hanging pan 2 to move up and down, and an insulating carbon blanket layer 9 is laid on the upper surface of the hanging pan 2;

[0037] The crucible bottom of the inner crucible 4 is provided with a ventilation pipe 5 for blowing liquid discharge gas into the inner crucible, and through the ventilation pipe 5, the inner crucible 4 is fixed under the hanging plate 2, and the ...

Embodiment 2

[0043] Such as figure 2 As shown, the present embodiment is based on the embodiment 1. In the sapphire crystal guided mode growth device, the inner crucible 4 is coaxially inverted in the outer crucible 6, and the center position of the crucible bottom of the inner crucible 4 has a mold extension. The mold limit sleeve 10 that is inserted into and communicated with the bottom of the crucible of the inner crucible 4; the bottom of the crucible of the inner crucible 4 is provided with a vent pipe installation hole 11, and the vent pipe installation hole 11 is a threaded hole, and the vent pipe 5 is fixed on the The vent tube is installed in the hole.

[0044] In this embodiment, the inner crucible 4 is coaxially inverted in the outer crucible 6, which facilitates and effectively controls the height of the liquid level of the melt, so that the height of the liquid level of the melt remains unchanged; The limit is in the mold limit sleeve 10, so that the crystal grows stably; th...

Embodiment 3

[0046] In this embodiment, on the basis of Embodiment 1, in the sapphire crystal guided mode growth method, a mixed protective gas of Ar, CO and CO is introduced into the thermal field. 2 of mixed gas.

[0047] In this embodiment, the mixed protective gas can effectively inhibit the evaporation of alumina at 2100 to 2200 degrees, and can also effectively prevent the evaporated alumina vapor from reacting with other graphite materials in the thermal field, and also reduce the interaction between graphite materials and The degree of reaction between the mold 1 and the Mo / W metal such as the crucible in the thermal field, because the conductive film method uses a graphite material insulation system, and the system is in a high temperature environment above 2100 degrees, the reaction equation of the position where the graphite contacts the metal is as follows:

[0048] W + C = WC[1]

[0049] Mo + C = Mo 3 C [2]

[0050] Considering the evaporation of alumina, C, Mo and W,

[0...

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Abstract

The invention relates to a sapphire crystal growing device adopting edge defined film-fed growth techniques and a growing method. The sapphire crystal growing device adopting the edge defined film-fed growth techniques comprises a crystal growing furnace, wherein an outer crucible used for containing an aluminum oxide solution, a hanging plate arranged above an opening of the outer crucible and matched with the opening of the outer crucible and an inner crucible inversely arranged in the outer crucible are arranged in the furnace. According to the growing method for growing the sapphire crystal by using the sapphire crystal growing device adopting the edge defined film-fed growth techniques, mixed drain gas is injected into the inverted inner crucible through a vent pipe, and meanwhile, mixed protective gas is introduced into a thermal field. The sapphire crystal growing device and the growing method have the advantages as follows: the liquid level height of melt in the crucibles can be kept in the crystal growing process, the system cannot be blocked and is free from vibration, meanwhile, the service life of the thermal field made of metals such as Mo / W and the like is effectively prolonged, the loading process is simplified, the upper edge of the mold is far away from the melt, deformation is prevented accordingly, the service life of the mold can be prolonged, and the crystal growing cost is reduced.

Description

technical field [0001] The invention belongs to the technical field of crystal manufacturing, and relates to a sapphire crystal guided mode growth device and a growth method thereof, in particular to a sapphire crystal guided mode growth device and a growth method capable of maintaining the liquid level in a crucible and protected by a protective gas . Background technique [0002] There are many methods for the growth of sapphire crystal materials, mainly including: Kyropolous method (Ky method for short), guided mode method (Edge Defined Film-fed Growth techniques method, EFG method for short), heat exchange method ( That is, Heat Exchange Method (HEM method for short), pulling method (Czochralski method, Cz method for short), Bridgman method (Bridgman method, crucible drop method) and so on. [0003] The raw material of the film guide method is to use the capillary slit on the mold to lift the raw material in the crucible to the top of the mold through capillary phenomen...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C30B15/34C30B29/20
Inventor 薛卫明马远帕维尔.斯万诺夫吴勇牛沈军周健杰
Owner JIANGSU CEC ZHENHUA CRYSTAL TECH
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