A detection device and method based on double-beam differential elimination of photoelastic modulator and environmental influence
A photoelastic modulator and environmental impact technology, applied in the field of optical detection, can solve problems such as unstable detection signals, and achieve the effect of ensuring stability
Active Publication Date: 2017-04-12
BEIHANG UNIV
View PDF5 Cites 0 Cited by
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View moreImage
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0024] figure 1 It is a structural block diagram of the implementation of the detection device based on the double-beam differential elimination of the photoelastic modulator itself and the environment of the present invention. It can be seen from the figure that the implementation structure block diagram of the detection device based on the double-beam differential elimination photoelastic modulator and environmental impact includes an optical module and a measurement module. The optical module consists of a laser light source 1, a polarizer 2, a laser power stabilization module 3, an elimination Polarizing beam splitter prism 4, half-wave plate 5, first reflector 6, second reflector 7, third reflector 8, photoelastic modulator 9, photoelastic controller 10 and analyzer 11; measure The module is composed of a first photodetector 12 , a second photodetector 13 , a lock-in amplifier 14 , and a signal acquisition and processing system 15 . The positional relationship of the abo...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
Login to View More Abstract
The invention relates to a detection device and method for eliminating photoelastic modulator and environment influence based on double beam difference. The detection device for eliminating the photoelastic modulator and environment influence based on double beam difference comprises an optical module and a measuring module, and the optical module is composed of a laser, a polarizer, a beam splitter, a photoelastic modulator and a polarization analyzer; the measuring module is composed of two photoelectric detectors, a phase-locked amplifier and a digital signal processing system. The detection device and method for eliminating the photoelastic modulator and environment influence based on double beam difference are characterized in that two beams of light with the same state are converted into electric signals through the photoelectric detector after passing through the same photoelastic modulator, the electric signals are analyzed through the phase-locked amplifier and digital signal processing system to obtain modulation amplitudes and residual stress double-refraction angles corresponding to the two light beams, and the analyzed two ways of signals are performed with difference treatment to eliminate unsteady factors caused by the photoelastic modulator and environment change. By means of the detection device and method for eliminating the photoelastic modulator and environment influence based on double beam difference, the detectable signal-to-noise ratio and signal stability are greatly improved in the photoelastic modulation detection.
Description
technical field [0001] The invention relates to the field of optical detection, in particular to a detection device and method based on double-beam differential elimination of photoelastic modulator and environmental influence. [0002] technical background [0003] The high-frequency modulation of linearly polarized light by the photoelastic modulator effectively improves the detection of the small rotation angle of the polarization plane of the incident polarized beam, and isolates the noise caused by low frequency, 1 / f, and slow drift. Especially in some application fields that require long-term stability of the system, the stability of the modulation detection system itself is very important. [0004] The performance of the modulator in photoelastic modulation detection directly affects the output of the detection signal. The birefringence caused by the residual stress of the photoelastic modulator is the main index reflecting the performance of the photoelastic modulato...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
Login to View More Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/26G01D5/30
Inventor 房建成段利红胡朝晖李茹杰姜丽伟
Owner BEIHANG UNIV