Imaging Optical Systems for Visible-Ultraviolet Detection Microscopes

Abstract

The invention provides an optical imaging system for an ultraviolet and visible light detection microscope. The optical imaging system comprises a first lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, a seventh lens, an eighth lens, a ninth lens, a tenth lens, an eleventh lens, a twelfth lens, a thirteenth lens, a fourteenth lens, a fifteenth lens, a sixteenth lens, a seventeenth lens and an eighteenth lens in sequence in the direction of the optical axis of the optical imaging system, wherein the first lens, the second lens, the third lens and the fourth lens form a first lens group G1, and the combined focal length of the first lens group G1 is 200 mm; the fifth lens, the sixth lens, the seventh lens, the eighth lens, the ninth lens, the tenth lens, the eleventh lens, the twelfth lens, the thirteenth lens, the fourteenth lens, the fifteenth lens, the sixteenth lens, the seventeenth lens and the eighteenth lens form a second lens group G2, and the combined focal length of the second lens group G2 is 4 mm; the amplification factor from an object plane to an image plane is 1 / 50, the radius of the view field of an object space is 10 mm, and the numerical aperture of an image space is realized to be 0.85. The optical imaging system is totally made of high-transparency i-line glass, and the imaging quality approaches perfect imaging; moreover, the optical imaging system is compact in structure and capable of completely meeting the technical requirements of the ultraviolet and visible light detection microscope.

Description

technical field [0001] The invention relates to an imaging optical system, in particular to an imaging optical system for a visible-ultraviolet detection microscope. Background technique [0002] In various fields such as physics, chemistry, material science, and life science, the scope of application of ultraviolet microscopes continues to expand; especially in the fields of semiconductor industry and optoelectronics industry, ultraviolet microscopes have become a very important detection equipment. The ultraviolet microscope can be used for the detection of photolithographic patterns on silicon wafers (or reticles) after exposure, development, etching and other processes, and can quickly observe the overall effect of photolithographic patterns on silicon wafers (or reticles). Measuring the line width (CD) of lithographic patterns and defect detection, etc. [0003] Ultraviolet microscopes can also be used for the inspection of semiconductor packaging lithographic patterns...

AI Technical Summary

Problems solved by technology

[0010] ■According to the description of the invention patent, it is claimed to adopt the double telecentric design of object space and image space, but no data of telecentricity deviation is provided

[0011] Most of the optical system adopts cemented lens group. If it is applied to advanced packaging lithography, HDI plate lithography, printing plate lithography, etc. For high-dose exposure applications

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