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resist stripper

A technology of resist stripper and anti-corrosion agent, applied in the field of photolithography, can solve problems such as wiring corrosion, and achieve the effects of excellent corrosion resistance, good corrosion resistance effect and lower production cost

Active Publication Date: 2019-01-25
芜湖米诺环保科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Therefore, the water-based stripper has a disadvantage of causing corrosion to conductors such as wiring.

Method used

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preparation example Construction

[0038] The preparation method of described hydroxyethyl-oleic acid imidazoline is specifically:

[0039]Add 1L of oleic acid and 400mL of hydroxyethylethylenediamine into a 2.5L reaction vessel, the reaction vessel is connected with a water separator and a condenser, then add 450ml of xylene in the reaction vessel as a water-carrying agent, start the mixer, and heat up to Reflux began at 150°C, water was generated, and after reflux for 2 hours, the temperature was raised to 230°C, and the reaction was completed for 6 hours. The excess solvent was evaporated under reduced pressure, and the product was completely dried in a drying oven to obtain the product.

[0040] The structural formula of hydroxyethyl-oleic acid imidazoline is as follows:

[0041]

[0042] The organic solvent includes one or more substances selected from the group consisting of N-methylpyrrolidone (NMP), 1,3-dimethyl-2-imidazolinone (DMI), dimethylsulfoxide (DMSO) , dimethylacetamide (DMAc), dimethylform...

Embodiment 1

[0054] The preparation of embodiment 1 imidazolinone formamide compound

[0055] Put 50g of 4-chloroacetophenone and 20ml of glacial acetic acid into a 300ml reaction vessel in turn, add 45g of bromine solution dropwise under mechanical stirring at room temperature, keep 1ml / min, after the addition is complete, continue to react for 1 hour, and pour the reaction solution into saturated carbonic acid In the sodium solution, adjust the pH value to neutral, extract with dichloromethane containing ice cubes, wash the extract twice with saturated sodium carbonate, and wash with water successively, dry the organic layer with anhydrous sodium sulfate, and remove the dichloromethane under reduced pressure , the solid was washed with petroleum ether, and suction filtered to obtain 7.5g of solid, which was 4-chloro-α-bromoacetophenone; in a 1L reaction vessel, 6g of 4-chloro-α-bromoacetophenone and 50ml Solvent chloroform, stirred and dissolved, added 5g urotropine, reacted at room temp...

Embodiment 22

[0059] The preparation of embodiment 22-oxazolidinone

[0060] Add 50g of ethanolamine, 75g of dimethyl carbonate and 2.5g of zinc acetate into the stirring reflux reaction device, heat up to 80 degrees for reflux reaction for 4 hours, then remove the solvent, and recrystallize with absolute ethanol to obtain 50g of the product 2-oxazolidine ketone.

[0061] product of 1 HNMR analysis

[0062] 1 HNMR (CDCl 3 )

[0063] δ: 6.32(br, -NH), 4.46(t, J=7.2Hz, 2H, -CH 2 O), 3.65(t, J=7.2Hz, 2H, -CH 2 NH).

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Abstract

A provided anticorrosion remover comprises the following raw materials: an anticorrosive agent, an amine compound premix, an organic solvent, deionized water and a C2-C15 monohydric alcohol. The provided anticorrosion remover is excellent and safe in peeling performance, does not corrode electric conductors and is excellent in anticorrosion performance, is relatively good in peeling performance compared with anticorrosion removers provided before by the inventor, and is relatively good in anticorrosion effect. Also, the enterprise production cost is reduced because the usage amount of the anticorrosive agent in the anticorrosion remover is relatively low.

Description

technical field [0001] The invention relates to the field of photolithography technology, in particular to a resist stripper, which has excellent stripping performance, is safe, and has corrosion resistance that does not corrode conductors. Background technique [0002] Integrated circuits such as IC and LSI, display devices such as LCD and EL elements, and printed substrates are manufactured using thermal etching technology. In this thermal etching step, unnecessary resist is removed using a resist stripper. [0003] In this resist stripping step, various resist stripping agents are previously used. However, in recent years, the ability to cope with the process miniaturization of liquid crystal display panels and semiconductor elements or short-time processing is low, and further performance is expected. Currently, resist strippers containing amine compounds excellent in stripping properties are the main force. [0004] The amine-based stripper can be classified into sol...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/42
Inventor 不公告发明人
Owner 芜湖米诺环保科技有限公司