Graphene/noncrystalline silicon solar battery and preparation method thereof
A solar cell and graphene technology, applied in the field of solar energy, can solve the problems of high cost of battery power generation and restrictions on wide application, and achieve the effects of easy promotion, simple preparation process, and low cost
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Embodiment 1
[0021] 1) Clean the glass substrate in deionized water and dry it;
[0022] 2) Deposit indium-doped tin oxide with a thickness of 500 nanometers on a glass substrate by magnetron sputtering;
[0023] 3) Deposit a 5nm-thick n-type amorphous silicon film layer on the indium-doped tin oxide layer by chemical vapor deposition technology, and then deposit a 10-micron-thick i-type amorphous silicon film layer on it, and pre-coat the ITO layer. Reserve the area for growing the first electrode;
[0024] 4) Transfer single-layer graphene onto the i-type amorphous silicon film layer;
[0025] 5) Coating silver paste on the graphene and the reserved area of the ITO layer and drying to obtain a graphene / amorphous silicon solar cell.
Embodiment 2
[0027] 1) Clean the flexible PET substrate in deionized water and dry it;
[0028] 2) Deposit 1 nm thick gold on PET substrate by magnetron sputtering;
[0029] 3) Use plasma-enhanced chemical vapor deposition technology to grow a 5-nanometer-thick n-type amorphous silicon film layer on the gold conductive layer, and then use the same technology to deposit a 10-nanometer-thick i-type amorphous silicon film layer on it. Reserve an area for growing the first electrode on the conductive layer;
[0030] 4) Transfer 10 layers of graphene onto the i-type amorphous silicon film layer;
[0031] 5) Coating titanium-palladium-silver composite electrodes on the graphene and the reserved area on the gold conductive layer by electron beam evaporation to obtain graphene / amorphous silicon solar cells.
Embodiment 3
[0033] 1) Clean the flexible PI substrate in deionized water and dry it;
[0034] 2) AZO with a thickness of 40 nm was deposited on the PI substrate by magnetron sputtering;
[0035] 3) On the AZO layer, use plasma-enhanced chemical vapor deposition technology to grow a 500-nanometer-thick n-type amorphous silicon film layer, and then use the same technology to deposit a 0.8-micron-thick i-type amorphous silicon film layer on it, and on the AZO layer The area reserved for growing the first electrode;
[0036] 4) Transfer 5 layers of graphene onto the i-type amorphous silicon film layer;
[0037] 5) Coat the reserved area on the graphene and the AZO layer by depositing nickel electrodes using thermal evaporation technology to obtain graphene / amorphous silicon solar cells.
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